Specific Process Knowledge/Lithography/4562

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AZ 4562 is a positive UV photoresist for thick coatings (5µm and above).

Priming

Spin coating

Spin curves for AZ MiR 701 (29cps) using a 30s spin-off, and a 60s@90°C softbake (proximity bake for Gamma)


Exposure

Development

The recommended development speed for AZ 4562 is 2µm/min. A

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