Specific Process Knowledge/Wafer cleaning

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Clean with:

  • RCA - Two step process to remove organics and metals
  • 7-up - Fake piranha etch of wafers and masks - removes organics and alkali ions
  • Piranha - Removes organics and alkali ions
  • BHF - Removing native oxide, etching of predep glass etc.
  • IMEC - Cleaning before fusion bonding
  • Soap Sonic - Cleaning of "dirty" wafers when entering the cleanroom