LabAdviser/Technology Research/Technology Development of 3D Silicon Plasma Etching process for Novel Devices and Applications

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Technology Development of 3D Silicon Plasma Etching process for Novel Devices and Applications

• Project type: Ph.d. project
• Project responsible: Bingdong Chang
• Supervisors:Henri Jansen, Flemming Jensen, Jörg Hübner
• Partners involved: DTU Danchip

Publications in peer-reviewed journal papers

Publications as first author

• DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process

Chang, B., Leussink, P., Jensen, F., Hübner, J. and Jansen, H.,

Microelectronic Engineering, 191, pp.77-83 (2018) DOI

• DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro-and nanostructures by a modified Bosch etch process

Chang, B., Jensen, F., Hübner, J. and Jansen, H

Journal of Micromechanics and Microengineering, 28(10), p.105012 (2018) DOI

• Confined Growth of ZIF‐8 Nanocrystals with Tunable Structural Colors

Chang, B., Yang, Y., Jansen, H., Ding, F., Mølhave, K. and Sun, H.

Advanced Materials Interfaces, 5(9), p.1701270 (2018) DOI

• Highly Ordered 3D Silicon Micro‐Mesh Structures Integrated with Nanowire Arrays: A Multifunctional Platform for Photodegradation, Photocurrent Generation, and Materials Conversion

Chang, B., Tang, Y., Liang, M., Jansen, H., Jensen, F., Wang, B., Mølhave, K., Hübner, J. and Sun, H.

ChemNanoMat (2018) DOI

• Large Area Three- Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects

Chang, B., Zhou, C., Tarekegne, A., Yang, Y., Zhao, D., Jensen, F., Hübner, J., Jansen, H.

Advanced Optical Materials (2018) DOI

Publications as co-author

Inductively coupled plasma nanoetching of atomic layer deposition alumina

Han, A., Chang, B., Todeschini, M., Le, H. T., Tiddi, W., and Keil, M.

Microelectronic Engineering (2018) DOI