Feedback to this page: click here

Technology Development of 3D Silicon Plasma Etching process for Novel Devices and Applications

Project type: Ph.d. project
Project responsible: Bingdong Chang
Supervisors:Henri Jansen, Flemming Jensen, Jörg Hübner
Partners involved: DTU Danchip

Project Description

Publications in peer-reviewed journal papers

Publications as first author

DREM: Infinite etch selectivity and optimized scallop size distribution with conventional photoresists in an adapted multiplexed Bosch DRIE process

Chang, B., Leussink, P., Jensen, F., Hübner, J. and Jansen, H.,

Microelectronic Engineering, 191, pp.77-83 (2018) DOI

DREM2: a facile fabrication strategy for freestanding three dimensional silicon micro-and nanostructures by a modified Bosch etch process

Chang, B., Jensen, F., Hübner, J. and Jansen, H

Journal of Micromechanics and Microengineering, 28(10), p.105012 (2018) DOI

Confined Growth of ZIF‐8 Nanocrystals with Tunable Structural Colors

Chang, B., Yang, Y., Jansen, H., Ding, F., Mølhave, K. and Sun, H.

Advanced Materials Interfaces, 5(9), p.1701270 (2018) DOI

Highly Ordered 3D Silicon Micro‐Mesh Structures Integrated with Nanowire Arrays: A Multifunctional Platform for Photodegradation, Photocurrent Generation, and Materials Conversion

Chang, B., Tang, Y., Liang, M., Jansen, H., Jensen, F., Wang, B., Mølhave, K., Hübner, J. and Sun, H.

ChemNanoMat (2018) DOI

Large Area Three- Dimensional Photonic Crystal Membranes: Single-Run Fabrication and Applications with Embedded Planar Defects

Chang, B., Zhou, C., Tarekegne, A., Yang, Y., Zhao, D., Jensen, F., Hübner, J., Jansen, H.

Advanced Optical Materials (2018) DOI

Publications as co-author

Inductively coupled plasma nanoetching of atomic layer deposition alumina

Han, A., Chang, B., Todeschini, M., Le, H. T., Tiddi, W., and Keil, M.

Microelectronic Engineering (2018) DOI