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Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic/Isoslow7

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< Specific Process Knowledge‎ | Etch‎ | DRIE-Pegasus‎ | Isotropic

Revision as of 12:53, 30 July 2018 by Jmli (talk | contribs)

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**Process runs**
Date	Substrate Information				Process Information				SEM Images
Date	Wafer info	Mask	Material/ Exposed area	Tool / Operator	Conditioning	Recipe	Wafer ID	Comments	SEM Images
28/2-2014	4"	travka50 wafer 1.5 µm AZ	Si / 50 %	Pegasus/jmli	1 minute TDESC clean + MU runs	jml/isotropic/isoslow7 1:00 minutes	S003900	Bottom fine!!

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