File:E beam Cr 10Angs s.jpeg

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Revision as of 07:37, 13 August 2008 by Kn (talk | contribs) (AFM picture of Cr layerdeposited with e-beam evaporation in Wordentec. Deposition rate 10 Å/s.)
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AFM picture of Cr layerdeposited with e-beam evaporation in Wordentec. Deposition rate 10 Å/s.

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current07:37, 13 August 2008Thumbnail for version as of 07:37, 13 August 2008795 × 628 (114 KB)Kn (talk | contribs)AFM picture of Cr layerdeposited with e-beam evaporation in Wordentec. Deposition rate 10 Å/s.

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