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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/SOI/SOI

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< Specific Process Knowledge‎ | Etch‎ | DRIE-Pegasus‎ | showerheadchange

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**Process runs**
Date	Substrate Information				Process Information				SEM Images
Date	Wafer info	Mask	Material/ Exposed area	Tool / Operator	Conditioning	Recipe	Wafer ID	Comments	SEM Images
15/12-2014	4" Wafer with travka65 mask	AZ standard	Si / 65 %	Pegasus/jmli	10 minute TDESC clean	danchip/jml/showerhead/SOI/SOI, 96 cyc or 8:00 mins	S004745	New showerhead

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