Specific Process Knowledge/Wafer cleaning/IMEC

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The IMEC process is used for cleaning of wafers prior to fusion bonding

The IMEC cleaning process is used in circumstances where extraordinary clean wafers are required. It is primarily intended for cleaning wafers prior to fusion bonding. This procedure is based on the IMEC cleaning process: M. Meuris et al. "The IMEC clean: A new concept for particle and metal removal on Si surfaces.", Solid state Technology, Vol. 38, Issue 7, pp 109-113, 1995. Has been slightly modified by Karen Birkelund.

Information about the equipment used in this procedure cand be found in LabManager:
Info page for 'Wafer Cleaning'

Step	Process	Details	Comments	Comments
1	Pre-bond cleaning of Si wafers prior to fusion bonding.	.	Takes approximately 1,5 hours Orient flat to minimize handling Preferably do the cleaning just before bonding to maintain cleanliness!	Get CLEAN box for wafers!!!
2	Piranha	Mixture: H2SO4:H2O2 (4:1) Temp: 80oC Time: 5 min (a yellow and a black spot)	You can use the 'Mask Clean' bath in Wet Bench 04 (in cleanroom D-3). However, this requires planning at least a couple of days in advance, since the bath is primarily used for other purposes!. Alternatively use a very clean glass beaker. The recommended procedure is: Pour H2SO4 into bath/beaker Place wafers in clean carrier (USE this in steps 2-7) Add H2O2 to the beaker that already contains H2SO4 Wait 30 sec to ensure mixing of chemicals, then dip wafers.	Maybe clean the tank the day before!
3	Rinse	2 min. rinse	Rinse you wafers with DI-water.	Put into dedicated wet box for IMEC
4	IMEC	Mixture: DI water:5% HF:Isopropanol (100:10:1) Temp: 25 oC Time: 100 sec (two black spots)	Make an appointment some days in advance with a Danchip employee to help you with this step! Clean tank (Cleanroom D-3, the 'Optional Bath' inside Wet Bench 05: Al etch) Mix your IMEC solution in dedicated bottle (IMEC) inside a fume hood Ask a Danchip employee to help you filling the solution into the 'Optional Bath' tank!	.
5	Rinse	2 min. rinse	Put into dedicated wet box for IMEC	.
6	Piranha	Not nitride wafers! Mixture: H2SO4:H2O2 (4:1) Temp: 80 oC Time: 20 min	Re-use previous piranha Makes wafers hydrophilic	.
7	Rinse & spin dry	5 min rinse	.	.
8	Put wafers in new clean carrier box	.	.	.