Specific Process Knowledge/Lithography/NanoImprintLithography

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Imprinter 01

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The Imprinter 01 is a system for imprinting in polymers. 2 different types of imprinting can be done: Hot embossing and flash imprint. It is not possible to align the wafers one wishes to imprint (except by eye).

The user manual, user APV, and contact information can be found in LabManager





Overview of the performance of the Imprinter 01 and some process related parameters

Purpose
  • Imprinting
Performance Alignment accuracy
  • Only by eye
Process parameter range Process Temperature
  • Room temperature to 200°C
Process pressure
  • ~51mbar - atm
Imprint Pressure
  • 0-6 bar
Substrates Batch size
  • Pieces to 4" wafers
Substrate material allowed
  • Silicon
  • Quartz
  • Pyrex
Material allowed on the substrate
  • Silicon oxide
  • Silicon (oxy)nitride
  • Poly Silicon
  • Photoresist
  • PMMA
  • TOPAS
  • SU-8
  • Metals: Au, Sn, Ag, Al, Ti.