Specific Process Knowledge/Etch/ICP Metal Etcher/silicon/isotropic
Isotropic etching in silicon on the ICP Metal Etch
| Recipe | Step | Temp. | Time | Pres. | Hardware | Gasses | RF powers | Observations | |||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| SF6 | O2 | C4F8 | Ar | CF4 | H2 | CH4 | BCl3 | Cl2 | HBr | Coil | Platen | Runs | Keywords | ||||||
| isoslow1 | A | 20 | - | 90 ? | 50 ? | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 400 | 3 | 1 | NA | |
| r | A | 20 | - | 28 | LF+B100 | 30 | 37 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 100 | 1 | NA |