Specific Process Knowledge/Etch/DRIE-Pegasus/processA/PrA-0

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Process runs
Date Substrate Information Process Information SEM Images
Wafer info Material/ Exposed area Conditioning Recipe Wafer ID
18/8-2014 4" Danchip QC Wafer 1.5 µm AZ resist, daq2 mask Si / 10 % Pegasus/jmli 10 minute TDESC clean, 10 minute PR strip post process danchip/QC/QCprocA, 55 cycles (11+44) or 10:05 minutes S004257 OLD showerhead

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