Specific Process Knowledge/Etch/DRIE-Pegasus/DUVetch

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Process parameters
Recipe Step Temp. Deposition step Etch step Process
Time Pressure C4F8 SF6 O2 Coil Time Pressure C4F8 SF6 O2 Coil Platen HW Runs Keywords
B M B M B M B M B M B M B M
NBoost04 A 20 2.8 5 60 0 0 500 1.5 3.5 30% 5 0 20 100 100 0 0 500 500 50 10 LF+B100 2 VERY nice: scallops, straight sidewalls


Process parameters
Recipe Step Temp. Deposition step Etch step Process observations
Time Pressure C4F8 SF6 O2 Coil Time Pressure C4F8 SF6 O2 Coil Platen HW Runs Key words
polySOI-10 etch 20 2.5 10 50 0 0 600 5 10 20 60 5 400 40 - 5 very nice, blurred scallops
polySOI-10a etch 20 2.5 10 50 0 0 600 5 10 10 70 5 400 40 - 200+ very stable, excellent and extensive track record
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