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SEM Supra 2

The SEM Supra 2 a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.

The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the Se2 and InLens detectors will no longer work.

This SEM has large chamber volume compared to the other SEMs at Danchip. An 8" wafer can be loaded in the chamber, however the X and Y ranges only provide full view of a 6" wafer.

All samples must be introduced into the chamber using an airlock. The airlock greatly reduces sample exchange times, and it accepts up to 8" wafer holders.

The SEM is equipped with an Oxford Instruments X-MaxN 50 EDX detector and AZtec software. EDX (Energy dispersive X-ray) detection is used for element composition analysis in a small area. A specific training is needed for users that want to use the EDX detector.

The SEM Supra2 in located in the cleanroom. It was installed in December 2013.

The user manual, control instruction, the user APV and contact information can be found in LabManager:

SEM Supra 2 info page in LabManager

Equipment performances

Equipment		SEM Supra 2 (Supra 60VP SEM)
Purpose	Imaging and measurement of	Any sample except bulk insulators such as polymers, glass or quartz wafers
Location		Cleanroom of DTU Danchip
Performance	Resolution	1-2 nm (limited by vibrations) The resolution is strongly dependent on the type of sample and the skills of the operator.
Instrument specifics	Detectors	Secondary electron (Se2) Inlens secondary electron (Inlens) 4 Quadrant Backscatter electron (QBSD) Variable pressure secondary electron (VPSE)
	Stage	X, Y: 150 × 150 mm T: -10 to 70^o R: 360^o Z: 50 mm
	Electron source	FEG (Field Emission Gun) source
	Operating pressures	Fixed at High vacuum (2 × 10^-4mbar - 10^-6mbar) Variable at Low vacuum (0.1 mbar - 2 mbar)
	Options	Antivibration platform Fjeld M-200 airlock taking up to 8" wafers Oxford Instruments X-Max^N 50 mm² SDD EDX detector and AZtec software package
Substrates	Batch size	Up to 8" wafer with 6" view
	Allowed materials	Any standard cleanroom material