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Specific Process Knowledge/Thin film deposition/PECVD/Doping

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< Specific Process Knowledge‎ | Thin film deposition‎ | PECVD

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Recipes

Recipe name	SiH4 flow [sccm]	N₂O flow [sccm]	N2 flow [sccm]	B2H6 flow [sccm]	PH3 flow [sccm]	Pressure [mTorr]	Power [W]	Description
LFSiO	12	1420	392	0	0	550	60	Uniform silicon oxide
1PBSG	17	1600	0	135	40	500	800LF	BPSG glass for waveguide cladding layer

LF=Low Frequency

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