Specific Process Knowledge/Wafer cleaning/RCA

The RCA clean is used for cleaning the wafers before taking them into the furnaces and a few other equipments (check the cross contamination sheet). It consist of two solutions: RCA1 and RCA2

The RCA1 contains H${}_2$O, NH${}_4$OH and H${}_2$O${}_2$ (5:1:1). It is used for removed of light organics, particles and metal.

The RCA2 contains H${}_2$0, HCl and H${}_2$O${}_2$ (5:1:1). It is used for removal of heavy metals, alkalies and metal hydroxides.