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The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie.

Recipe: "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV"

Oxidation time: 80 min

Oxidation temperature: 1050 ^oC (all temoperature zones)

O₂ flow: 1 slm

The oxidation has been done with 150 mm wafer, and with 30 wafers in the furnace.

Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured.

Results

The oxide thickness has been measured in 13 points on each wafer using the M-2000V ellipsometer.

	Date	Wafer 4			Wafer 16			Wafer 28			Center point only
		Average oxide thickness [nm]	St. deviation	Non-uniformity [%]	Average oxide thickness [nm]	St. deviation	Non-uniformity [%]	Average oxide thickness [nm]	St. deviation	Non-uniformity [%]	Average oxide thickness [nm]	St. deviation	Non-uniformity [%]
Run 1	28-01-2015	109.7	1.0	1.7	107.7	0.9	1.1	106.5	0.8	1.2	107.0	2.1	1.9
Run 2	28-01-2015	107.3	1.7	2.4	105.0	1.4	1.7	107.3	0.7	0.9	105.7	1.0	0.9
Run 3	30-01-2015	103.6	0.8	1.1	102.6	0.6	1.2	102.2	0.6	1.1	102.9	1.0	1.0
Average		106.9	1.2	1.7	105.1	1.0	1.3	105.3	0.7	1.1	105.2	1.4	1.3
Common	Temperature 20 degs, HBC 10 torr, Short funnel, with baffle & 5mm spacers