Specific Process Knowledge/Wafer cleaning/RCA

From LabAdviser

The RCA clean is used for cleaning the wafers before taking them into the furnaces and a few other equipments (check the cross contamination sheet). It consist of two solutions: RCA1 and RCA2

The RCA1 contains H2O, NH4OH and H2O2 (5:1:1). It is used for removed of light organics, partiticles and metal.

The RCA2 cantains H20, HCl and H2O2 (5:1:1). It is used for removel of heavy metals, alkalis and metal hydroxides.

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