Specific Process Knowledge/Wafer cleaning/7-up & Piranha
Cleaning of wafers or masks
Cleaning of wafers or masks with sulphuric acid can be done either in a dedicated tank "7-up" or in the fumehood in a beaker "Piranha":
| 7-up | Piranha | |
|---|---|---|
| General description |
Cleaning of wafers or masks using the dedicated tanks. |
Cleaning of wafers or masks using a beaker in the fumehood. |
| Chemical solution | 98% Sulfuricacid and Ammoniumsulfat | 98% Sulfuricacid and Hydrogenperoxide 4:1 |
| Process temperature | 80 oC | ~70 oC |
| Possible masking materials |
None |
None |
| Etch rate |
Cleaning only |
Cleaning only |
| Batch size |
25 4" wafers or 5 masks at a time |
1-5 4" wafer at a time |
| Size of substrate |
4-6" wafers |
2-4" wafers |