Specific Process Knowledge/Wafer cleaning/IMEC
< Specific Process Knowledge | Wafer cleaning
Jump to navigation
Jump to search
Revision as of 11:45, 11 February 2008 by 192.38.87.73 (talk) (→IMEC process for cleaning of wafers before fusion bonding:)
Ikke godkendt
IMEC process for cleaning of wafers before fusion bonding:
Ophav IMEC Spørg Karen om der er lavet modificeringer
| Step | Process | Details | Comments | Comments |
|---|---|---|---|---|
| 1 | Pre bonding cleaning of Si wafers with cavities and SOI wafers with nitride | Use wafers with cavities on and SOI wafers
|
Get CLEAN box for wafers!!! | |
| 2 | Piranha | Mixture: H2SO4:H2O2 (4:1)
Temp: 80 oC Time: 5 min (a yellow and a black spot) |
Clean tank (cleanroom 4) and make your own or make in dedicated glass.
Pour up H2SO4 first, put wafers in carrier (USE this in steps4.1-4.6), add H2O2, wait 30 sec, dip wafers. |
Maybe clean the tank the day before!
Put into dedicated wet box for IMEC |
| 3 | Rinse | 2 min. rinse | Put into dedicated wet box for IMEC | |
| 4 | IMEC | DI water:5% HF:isopropanol (100:10:1)
Temp: 25 oC Time: 100 sec (two black spots) |
Clean tank (cleanroom 4) and make your own, it needs 2 bottles
Bottles are in service room 2 on the left, pump is by Leica microscope in cleanroom 3 |
Bottle for mixing is in service room 2, use BHF pump from RCA fumehood!
Put into dedicated wet box for IMEC |
| 5 | Rinse | 2 min. rinse | ||
| 6 | Piranha | Not nitride wafers!
Mixture: H2SO4:H2O2 (4:1) Temp: 80 oC Time: 20 min |
Re-use previous piranha
Makes wafers hydrophilic |
Put into dedicated wet box for IMEC |
| 7 | Rinse & spin dry | 5 min rinse | Put into dedicated wet box for IMEC | |
| 8 | Put wafers in new clean carrier box |