Specific Process Knowledge/Thermal Process/Dope with Boron

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Revision as of 13:55, 7 February 2008 by Yg (talk | contribs) (New page: ==Dope with boron== The furnace A2 boron predep can be used to predeposit silicon wafers with boron. The silicon wafers are positioned in a siliconcarbide boat just next to wafers of boron...)
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Dope with boron

The furnace A2 boron predep can be used to predeposit silicon wafers with boron. The silicon wafers are positioned in a siliconcarbide boat just next to wafers of boron nitride. Boron is predeposited on the silicon wafers. -Rune, hvad er det der sker?

The concentration of boron in the wafer depends on the process temperature. The depth profile depends of the process time

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