Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/Crystal Settings
| Settings for Crystal thickness monitor 1 | |||||
| Date | Tooling factor: TiO2 | Tooling factor: SiO2 | Tooling factor: Si | ||
|---|---|---|---|---|---|
| 22-7-2014 | 1.573 (wafer center) | ||||
| B | B1 | B2 | B3 | ||
| C | C1 | C2 | C3 | ||
| D | D1 | D2 | D3 | ||
| Settings for Crystal thickness monitor 2 | |||||
| Date | Tooling factor: TiO2 | Tooling factor: SiO2 | Tooling factor: Si | ||
|---|---|---|---|---|---|
| 22-7-2014 | 1.573 (wafer center) | ||||
| B | B1 | B2 | B3 | ||
| C | C1 | C2 | C3 | ||
| D | D1 | D2 | D3 | ||