Specific Process Knowledge/Wafer and sample drying

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Drying Comparison Table

Equipment	Hotplate: 90-110C	Spin dryer 1	Spin dryer 2	Spin dryer 3	Spin dryer 4	Single Wafer Spin dryer 1	Single Wafer Spin dryer 2	Single Wafer Spin dryer 3	Critical point dryer	Ethanol fume dryer	N2 guns
Location	C-1	B-1	D-3	E-5	B-1	C-1	D-3	D-3	C-1	In fumehoods and at chemical benches
Purpose	Drying	Drying	Drying	Drying Rinsing + drying	Drying	Drying	Drying	Drying sensitive samples. E.g. with cantilevers	Drying sensitive samples. E.g. with cantilevers	Drying all kind of samples.
Batch size	1-25 100 mm wafers	*1-25 100 mm wafers	1-25 100 mm wafers 1-25 150 mm wafers	1-25 50 mm wafers 1-25 100 mm wafers 1-25 150 mm wafers	one 100 mm wafer	one 100 mm wafer	one 100 mm wafer	1 to 5 wafers per run. Sizes: 2”, 4" or 6" Pieces (up to 10x10mm)	1-25 50 mm wafers 1-25 100 mm wafers Pieces if a suitable carrier is available	One sample at a time
Allowed materials	No restrictions	Only for RCA cleaned wafers	No restrictions	No restrictions	No restrictions	No restrictions	No restrictions	Si,SiO2, Si3N4 Quartz and Pyrex InAlP, GaAs SU8	No restriction except for polymers	No restriction

Choose a drying equipment

• Critical Point Dryer
• Spin Dryers