Specific Process Knowledge/Etch/Etching of Titanium

Etching of Titanium

Etching of Titanium is done wet at Danchip making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4 or in the PP-etch bath in the fume hood in cleanroom 2. We have ?:

BHF

Comparing the two solutions

	BHF
General description	Etch of titanium with or without photoresist mask.	Etch of
Chemical solution	HF:NH $_{4}$ F	.
Process temperature	Room temperature
Possible masking materials	Photoresist (1.5 µm AZ5214E)	.
Etch rate	?	?
Batch size	1-25 wafers at a time	1-25 wafer at a time
Size of substrate	4" wafers	4" wafers
Allowed materials	No restrictions when used in beaker or PP-etch bath in the fume hood in cleanroom 2.	Aluminium Silicon Silicon Oxide Silicon Nitride Silicon Oxynitride Photoresist E-beam resist