Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF)/BHF etch rates

Etch rate in	BHF	5% HF	30% HF
Wet Thermal Oxide [nm/min]	78.19	24.89	282.85
Silicon Rich Nitride [nm/min]	0.33	0.60	2.6
Selectivity SiO2:SiN	189.36	41.64	119.83

The measured etch rates have been made and donated by Eric Jensen from DTU-Nanotech October 2013.