File:Tensile stress Ni Wordentec.jpg

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current14:38, 24 April 2014Thumbnail for version as of 14:38, 24 April 20141,194 × 940 (90 KB)Knil (talk | contribs)For the page Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Nickel/Stress_Wordentec_Ni_films
10:23, 23 April 2014Thumbnail for version as of 10:23, 23 April 20141,618 × 1,143 (116 KB)Knil (talk | contribs)For this page: http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Nickel/Stress_Wordentec_Ni_films
10:21, 23 April 2014Thumbnail for version as of 10:21, 23 April 20141,618 × 1,143 (116 KB)Knil (talk | contribs)For this page: http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Nickel/Stress_Wordentec_Ni_films
10:14, 23 April 2014Thumbnail for version as of 10:14, 23 April 20141,618 × 1,143 (116 KB)Knil (talk | contribs)For the page: http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Nickel/Stress_Wordentec_Ni_films