Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Stress Wordentec Ni films
Stess in Wordentec deposited Nickel films
Section is under construction.
Thin films of Ni has tensile stress. It was examined if there is a difference in stress in Wordentec deposited Ni films and the result is presented here.
The rate was changed between the depositions, in most cases 200 nm of Ni was deposited.
| Deposition rate (Å/s) | Stress, average (MPa) | Thickness (nm) | Comment | Deposition date | |
| Tesile | Compressive | ||||
| 15 Å/s |
|
200 | vvvvvvvvvvvvvvvvvvvvvvvvv | 08-01-2014 | |
| 10 Å/s | R | R | R | R | R |
| 7 Å/s | 1 | 1 | 1 | R | R |
| 3 Å/s | 2 | 1 | A | R | R |
| 1 Å/s | . | O | O | O | O |