Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Stress Wordentec Ni films

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Stess in Wordentec deposited Nickel films

Section is under construction.


Deposition rate (Å/s) Compressive stress, average (MPa) Tensile stress, average (MPa) Thickness (nm) Comment Deposition date
15 Å/s


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10 Å/s R R R R R
7 Å/s 1 1 1 R R
3 Å/s 2 1 A R R
1 Å/s . O O O O