Specific Process Knowledge/Thin film deposition/Deposition of Nickel/Stress Wordentec Ni films

From LabAdviser

Stess in Wordentec deposited Nickel films

Section is under construction.


Rate (Å/s) Compressive stress, average (MPa) Tensile stress, average (MPa) Thickness (nm) Comment Deposition date
15 Å/s


200 vvvvvvvvvvvvvvvvvvvvvvvvv 08-01-2014
R R R


1 1 1


D 2 1 A
. O