Specific Process Knowledge/Thermal Process/Furnace Noble

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Noble furnace

The Noble Furnace is mostly used for annealing and oxidation of different samples. Annealing can be done in a nitrogen or argon atmosphere. Autumn 2013 a bubler has also been installed in the furnace, so it is possible to do both wet and dry oxidations. The maximum temperature of the furnace is 1000 ^oC.

In the Noble Furnaces more dirty samples with metals and some specific polymers are allowed. Different sample holder are available for wafers and smaller samples (placed on a Si carrier wafer).

The furnace is located in service area 3.

Please check the cross contamination information in LabManager before you use the furnace.

Noble furnace. Positioned in service area 3

The user manual, technical information and contact information can be found in LabManager:

Noble furnace

Overview of the performance of the Noble Furnace

Purpose	Oxidation Annealing	Oxidation: Dry Wet (with bubbler. water steam + N2) Annealing: N2 Ar
Process parameter range	Process Temperature	Up to 1000 oC
	Process pressure	1 atm
	Gasses on the system	N2: 0-5 SLM O2: 0-5 SLM Ar: 0-7 SLM
Substrates	Batch size	1-25 100 mm wafers (or 50 mm wafers) per run A number of smaller samples (placed on a Si carrier wafer)
	Substrate material allowed	Silicon samples (new from the box or RCA cleaned) Silicon samples with metals Silicon sample with polymers (only approved materials)