Specific Process Knowledge/Thermal Process/Furnace Noble

Noble furnace

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The Noble Furnace is mostly used for annealing and oxidation of different samples. Annealing can be done in a nitrogen or argon atmosphere. Recently (Autumn 2013) a bubler has also been installed in the furnace, so it is possible to do both wet and dry oxidations. The maximum temperature of the Noble furnace is 1000 ^oC.

In the Noble Furnaces more dirty samples with metal are allowed in the furnace. Different sample holder are available for wafers and smaller samples.

The furnace is located in in service area 3.

A1 Bor Drive-in furnace. Positioned in cleanroom 2

The user manual, technical information and contact information can be found in LabManager:

Noble furnace

Overview of the performance of the Noble Furnace

Purpose	Oxidation Annealing	Oxidation: Dry Wet (with bubbler) Annealing: N2: Argon
Process parameter range	Process Temperature	Up to 1000 oC
	Process pressure	1 atm
	Gasses on the system	N2:0-5 SLM O2: 0-5 SLM Argon: 0-7 SLM
Substrates	Batch size	1-25 100 mm wafers (or 50 mm wafers) per run
	Substrate material allowed	Silicon samples (new from the box or RCA cleaned) Silicon samples with metals Silicon sample with polymers (only approved materials)