File:Process Flow Trilayer Ebeam Resist.docx
Process_Flow_Trilayer_Ebeam_Resist.docx (file size: 208 KB, MIME type: application/vnd.openxmlformats-officedocument.wordprocessingml.document)
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Process flow for MMA/Ge/ZEP7000 trilayer stack for proximity-error correction-free e-beam writing.
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Date/Time | Dimensions | User | Comment | |
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current | 10:57, 6 August 2013 | (208 KB) | Tigre (talk | contribs) | Process flow for MMA/Ge/ZEP7000 trilayer stack for proximity-error correction-free e-beam writing. |
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File usage
The following 6 pages use this file:
- Specific Process Knowledge/Lithography/EBL/EBLresist
- Specific Process Knowledge/Lithography/EBL/EBLsubstratePrep
- Specific Process Knowledge/Lithography/EBeamLithography/EBLLandingpage
- Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep
- Specific Process Knowledge/Lithography/Resist
- Specific Process Knowledge/Lithography/Resist/Ebeamresist