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Below is a list of the most recent deletions.
- 17:33, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/Injection (content moved)
- 17:33, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/MoldClose (content moved)
- 17:32, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/MoldTemp (content moved)
- 17:14, 16 June 2025 Mmat talk contribs deleted page Category:Equipment/Characterization (no content (content before blanking was: "gujhguhg"))
- 17:11, 16 June 2025 Mmat talk contribs deleted page Category:Thin Film Depostion (no content)
- 14:55, 6 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/RaithElphyManual (content was: "'''Feedback to this page''': '''[mailto:e-beam@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]''' = <span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px = Purpose, location and technical specifications = '''OBSOLETE! This to...", and the only contributor was "Tigre" (talk))
- 10:23, 6 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL Processes (content before blanking was: "<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px =Large area circle arrays= Arrays of circles can naturally be exposed by exposing a pattern that consists of circles. In this scheme each circle will consist of a number of beam shots to fill the shape of each circle. For large areas this can however be very time consuming and pattern files can become very large. Hence, in this work we investigate a di...")
- 14:43, 5 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/ARP617 (content before blanking was: "Test of copolymer AR-P 617.05; a positive e-beam resist from AllResist. This copolymer is meant to be used as a sacrificial layer in a bi- or tri-layer e-beam resist stack (i.e. bottom layer). The copolymer adheres well on many substrates and can be dry-etched isotropically (to create under-cut) and anisotropically by reactive ion etch. Furthermore, it is softbaked at temperatures above 200 degrees and thus themally stable to many post-processing steps. This is...")
- 08:53, 5 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Molybdæn (content was: "=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px= <code><nowiki>=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px=</nowiki></code> <!-- =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px= --> ==Comp...", and the only contributor was "Mbec" (talk))
- 14:48, 2 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/HfO2 etch (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/IBE⁄IBSD_Ionfab_300/HfO2_etch click here]''' =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px= =jklajakjg= ==jglasdjfg==", and the only contributor was "Shuya" (talk))
- 14:27, 2 May 2025 Bghe talk contribs deleted page Substrates/130 mm by 130 mm by 6.35 mm substrates (not existing)
- 13:55, 2 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/Pegsus-1 (content was: "'''WRONG ADDRESS - MUST BE DELETED!!!!!''' '''The user manual(s), quality control procedure(s) and results, user APV(s), technical information and contact information can be found in LabManager:''' Equipment info in [http://labmanager.nanolab.dtu.dk/function.php?module=Machine&view=view&mach=265| LabManager] == Process information == '''SPTS process notation''' Describing a proces...", and the only contributor was "Jmli" (talk))
- 13:51, 2 May 2025 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus 3/DREM0.5kWv2.3 (content was: "<!--Checked for updates on 4/4-2025 - ok/jmli -->", and the only contributor was "Jmli" (talk))
- 13:51, 2 May 2025 Bghe talk contribs deleted page LabAdviser/314/Microscopy 314-307/TEM/T20/Schematic (content before blanking was: "800px")
- 13:50, 2 May 2025 Bghe talk contribs deleted page LabAdviser/314/Microscopy 314-307/TEM/T20/Booking rules (content before blanking was: "'''Tecnai TEM Booking rules:''' '''1) Booking''' Each Tecnai user can book up to 2 SESSIONS in advance. This means that users can have only 2 SESSIONS booked for the future. It does not matter how far in the future the two sessions are booked. e.g. sessions can be booked for today & tomorrow, or today and Monday next week. Once you have 2 sessions booked, you can't book any more. As soon as you have finished one session, you can then book another. But you ca...")
- 13:50, 2 May 2025 Bghe talk contribs deleted page LabAdviser/CEN (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/LabAdviser/CEN click here]''' =This page gives an overview of the electron microscope equipment and other related resources connected to DTU Nanolab - building 307/314= ==SEM== *SEM Comparison page - all of DTU Nanolabs SEMs */Nova Nan...")
- 13:49, 2 May 2025 Bghe talk contribs deleted page LabAdviser/CEN/AFEG 250 Analytical ESEM (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=LabAdviser/CEN/Quanta_FEG_200_ESEM click here]''' <!-- Replace "http://labadviser.danchip.dtu.dk/..." wih the link to the Labadviser page--> The FEI AFEG 250 FEG is a field emission scanning electron microscope with a spatial resolution of 2 nm for the ETD detector in high vacuum at 30 keV. The microscope can o...")
- 14:07, 31 March 2025 Bghe talk contribs deleted page LabAdviser/Courses/TPT Lithography (content was: "<span style="color:red">This page can be deleted</span> <!--- '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/LabAdviser/Courses/TPT_Lithography click here]''' DTU Nanolab offers a Tool Package Training in Lithography; the course includes theory on lithographic processes and equipment. After the TPT has been successfully completed, you can begin training on the lithography equipm...")
- 13:42, 31 March 2025 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Polymer/Etch of Photo Resist using RIE (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Polymer/Etch_of_Photo_Resist_using_RIE click here]''' =<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned </span> = * <span style="color:#FF0000"> This information is save because it might be valuable as inspiration for other dry etch s...")
- 13:03, 31 March 2025 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Sputtering of ITO in Sputter-System Metal-Oxide (PC1) (content was: "PLEASE DELETE THIS PAGE!", and the only contributor was "Eves" (talk))
- 13:03, 31 March 2025 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/XRD/XRD SmartLab/ALD deposited alumina and titania XRR and SE comparison (content was: "Empty page need to be deleted!", and the only contributor was "Eves" (talk))
- 12:54, 16 January 2025 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/JDF-TRAINING (Thomas Pedersen asked)
- 12:54, 16 January 2025 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/SDF-TRAINING (Thomas Pedersen asked)
- 10:14, 3 December 2024 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/Espacer (Thomas P asked me to delete it)
- 09:01, 2 September 2024 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/DiamondCVD (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/DiamondCVD click here]''' <i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i> == SEKI Diamond CVD - this machine is being decommissioned (2024) ==")
- 09:01, 2 September 2024 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/DiamondCVD/Diamond CVD process details (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/DiamondCVD/Diamond_CVD_process_details click here]''' ''All contents by DTU Nanolab staff unless otherwise noted.'' =Diamond growth is no longer possible at Nanolab=", and the only contributor was "Reet" (talk))
- 09:57, 3 January 2024 Bghe talk contribs deleted page File:E-beam Lithography Lecture Tine Greibe 2015 (4).pdf (Thomas Anhøj says so)
- 09:56, 3 January 2024 Bghe talk contribs deleted page File:9500FS maintenace check list.pdf (Thomas Anhøj says so)
- 09:56, 3 January 2024 Bghe talk contribs deleted page File:Height sensor.pdf (Thomas)
- 13:39, 2 January 2024 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithographyForNerds (OK fra Thomas Pedersen)
- 12:12, 2 January 2024 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/JEOL JBX-9500FSZ
- 12:11, 2 January 2024 Bghe talk contribs deleted page File:Lecture E-beam Lithography -LGPE.pdf (Thomas Anhøj says so)
- 12:49, 20 December 2023 Bghe talk contribs deleted page File:Stormode 2016.pdf
- 12:39, 20 December 2023 Bghe talk contribs deleted page File:Rie1 040810 02 ohpolya10.jpg
- 12:36, 20 December 2023 Bghe talk contribs deleted page File:SPTS ICP Metal Etcher.pdf
- 12:32, 20 December 2023 Bghe talk contribs deleted page File:141216 Kundestormode 2014 final right prices.pdf
- 15:14, 7 August 2023 Bghe talk contribs deleted page Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD/TiO2 deposition on trenches using ALD (content was: "Delete this page :)")
- 14:23, 23 May 2023 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Black Magic PECVD/MWNT (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Black_Magic_PECVD/MWNT click here]''' =''' <span style="color:#FF0000"> <big> This page is obsolete - the instrument has been moved to the physics department </big> </span> '''= ''' <span style="color:#FF0000"> <big> This page is not being updated at the moment </b...")
- 14:20, 23 May 2023 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Black Magic PECVD/Black Magic details (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Black_Magic_PECVD/Black_Magic_details click here]''' =''' <span style="color:#FF0000"> <big> This page is obsolete - the instrument has been moved to the physics department </big> </span> '''= ''' <span style="color:#FF0000"> <big> This page is not being updated at the mo...")
- 14:20, 23 May 2023 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Black Magic PECVD/Graphene (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Black_Magic_PECVD/Graphene. click here]''' =''' <span style="color:#FF0000"> <big> This page is obsolete - the instrument has been moved to the physics department </big> </span> '''= ''' <span style="color:#FF0000"> <big> This page is not being updated at the moment...")
- 14:19, 23 May 2023 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Black Magic PECVD (content before blanking was: "'''Feedback to this page''': '''[mailto:danchip-processengineering@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Black_Magic_PECVD click here]''' =''' <span style="color:#FF0000"> <big> This page is obsolete - the instrument has been moved to the physics department </big> </span> '''= Thin film Black Category: Thin Film Deposition|Black...")
- 15:50, 27 March 2023 Jehan talk contribs deleted page File:CleWin5UserGuide.pdf (is afraid of copyright violation)
- 15:49, 27 March 2023 Jehan talk contribs deleted page File:L-Edit User Guide.pdf (is afraid of copyright violation)
- 11:40, 24 March 2023 Bghe talk contribs deleted page Specific Process Knowledge/Etch/III-V RIE/III V RIE ETCHES/SiO2 DOE (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/III-V_RIE/III_V_RIE_ETCHES/SiO2_DOE click here]''' =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>200px=", and the only contributor was "Bghe" (talk))
- 10:01, 14 February 2023 Bghe talk contribs deleted page Oxide growth using HNO3 (content was: "hej", and the only contributor was "Mbec" (talk))
- 17:16, 6 February 2023 Bghe talk contribs deleted page Specific Process Knowledge/Back-end processing/Wafer Scriber (Rune: system no longer in the cleanroom)
- 15:20, 6 February 2023 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2/Images of 1SiO2mSi with p-Si mask (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Silicon_Oxide/SiO2_etch_using_RIE1_or_RIE2/Images_of_1SiO2mSi_with_p-Si_mask click here]''' =<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned </span> = ==This work was done on RIE1 which has been decommissioned but we expect the result...")
- 12:25, 3 February 2023 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiN Etch (content was: "==Stripping SRN from the whole wafer surface== This recipe has not been optimized for Silicon Rich Nitride but can be used for stripping one wafer side for the nitride when an over etch in the underlaying layer is not a problem.", and the only contributor was "Bghe" (talk))
- 16:40, 2 February 2023 Bghe talk contribs deleted page File:Section under construction.jpg (Deleted old revision 20230202141120!Section_under_construction.jpg)
- 12:08, 30 January 2023 Bghe talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithography/Developer E-beam (Request from Thomas Pedersen)