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16:35, 23 May 2023 User account Marbur talk contribs was created automatically
13:23, 23 May 2023 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Black Magic PECVD/MWNT (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Black_Magic_PECVD/MWNT click here]''' =''' <big> This page is obsolete - the instrument has been moved to the physics department </big> '''= ''' <big> This page is not being updated at the moment </b...")
13:20, 23 May 2023 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Black Magic PECVD/Black Magic details (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Black_Magic_PECVD/Black_Magic_details click here]''' =''' <big> This page is obsolete - the instrument has been moved to the physics department </big> '''= ''' <big> This page is not being updated at the mo...")
13:20, 23 May 2023 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Black Magic PECVD/Graphene (content before blanking was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Black_Magic_PECVD/Graphene. click here]''' =''' <big> This page is obsolete - the instrument has been moved to the physics department </big> '''= ''' <big> This page is not being updated at the moment...")
13:19, 23 May 2023 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Black Magic PECVD (content before blanking was: "'''Feedback to this page''': '''[mailto:danchip-processengineering@danchip.dtu.dk?Subject=Feed%20back%20from%20page%http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Black_Magic_PECVD click here]''' =''' <big> This page is obsolete - the instrument has been moved to the physics department </big> '''= Thin film Black Category: Thin Film Deposition|Black...")
12:02, 23 May 2023 User account Marlaur talk contribs was created automatically
16:03, 19 May 2023 User account S222403 talk contribs was created automatically
14:11, 17 May 2023 Reet talk contribs created page File:Nanolab SEM lecture 2023 Februar part2 attempttocompress.pptx (File uploaded with MsUpload)
14:11, 17 May 2023 Reet talk contribs uploaded File:Nanolab SEM lecture 2023 Februar part2 attempttocompress.pptx (File uploaded with MsUpload)
14:39, 15 May 2023 Mfarin talk contribs created page File:SiO2 ICP.2-top-02.png (File uploaded with MsUpload)
14:39, 15 May 2023 Mfarin talk contribs uploaded File:SiO2 ICP.2-top-02.png (File uploaded with MsUpload)
14:39, 15 May 2023 Mfarin talk contribs created page File:SiO2 ICP.2-top-04.png (File uploaded with MsUpload)
14:39, 15 May 2023 Mfarin talk contribs uploaded File:SiO2 ICP.2-top-04.png (File uploaded with MsUpload)
14:37, 15 May 2023 Mfarin talk contribs created page File:SiO2 ICP.2 top 04.tif (File uploaded with MsUpload)
14:37, 15 May 2023 Mfarin talk contribs uploaded File:SiO2 ICP.2 top 04.tif (File uploaded with MsUpload)
14:37, 15 May 2023 Mfarin talk contribs created page File:SiO2 ICP.2 top 02.tif (File uploaded with MsUpload)
14:37, 15 May 2023 Mfarin talk contribs uploaded File:SiO2 ICP.2 top 02.tif (File uploaded with MsUpload)
13:16, 15 May 2023 Mfarin talk contribs created page Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/ICP recipe for SiO2 (Created page with " {| border="2" cellspacing="2" cellpadding="3" |-style="background:DarkGray; color:White" !Material to be etched !Recipe: 1SiO2_02 '''*This recipe is no longer stable.''' !Recipe: 1SiO2_03 !Testing other settings to increase etch rate in nitride |- |Etch rate in SiO2 |22.1 nm/min |26.8 nm/min |? |- |Etch rate in PECVD nitride |. |20.8nm/min (''kabi@nanolab 20190301'') - ~0nm/min (''ecsj@nanolab 20210729'') |? |- |Etch rate in LPCVD...")
15:33, 11 May 2023 User account Kricjv talk contribs was created automatically
14:45, 10 May 2023 User account Chrru talk contribs was created automatically
13:36, 10 May 2023 Jehem talk contribs created page Template:Cc-nanolab (Created page with "This section, including all images and pictures, is created by DTU Nanolab staff unless otherwise stated.")
13:19, 10 May 2023 Jmli talk contribs created page Template:Cc-jehem1 (Created page with "''This work was done by jens''")
14:23, 9 May 2023 User account Divyad talk contribs was created automatically
11:08, 9 May 2023 Eves talk contribs created page File:1 DTU Nanolab Thin Film TPT final April 2023.pptx (File uploaded with MsUpload)
11:08, 9 May 2023 Eves talk contribs uploaded File:1 DTU Nanolab Thin Film TPT final April 2023.pptx (File uploaded with MsUpload)
11:08, 9 May 2023 Eves talk contribs created page File:2 DTU Nanolab Thin Film TPT final May2023.pptx (File uploaded with MsUpload)
11:08, 9 May 2023 Eves talk contribs uploaded File:2 DTU Nanolab Thin Film TPT final May2023.pptx (File uploaded with MsUpload)
14:16, 8 May 2023 Jmli talk contribs created page File:XPS survey.jpg (File uploaded with MsUpload)
14:16, 8 May 2023 Jmli talk contribs uploaded File:XPS survey.jpg (File uploaded with MsUpload)
12:03, 8 May 2023 User account Marhem talk contribs was created automatically
22:49, 5 May 2023 Thope talk contribs created page Specific Process Knowledge/Lithography/EBeamLithography/JEOLAlignment (Created page with "=Aligned exposure on JEOL 9500= There is quite a few things to remember in order to align an exposure to an existing pattern. The example below is a step by step guide illustrating global substrate alignment as well as chip alignment. ==Job preparation== ==Chip alignment== Chip alignment requires a global alignment to be made first to establish the wafer coordinate system. Hence a global alignment using '''GLMDET''' is used initially as in the example above. To further...")
14:02, 3 May 2023 User account S173942 talk contribs was created automatically
09:59, 3 May 2023 User account Cscdi talk contribs was created automatically
13:28, 2 May 2023 User account S212891 talk contribs was created automatically
15:33, 1 May 2023 Jmli talk contribs created page Template:Cc-vthongu1 (Created page with "''This work was done by Vy Thi Hoang Nguyen @Nanolab in her ph.d. project ending 2020''")
11:17, 28 April 2023 Jmli talk contribs created page Template:Image1 (Created page with "Image: DTU Nanolab internal")
10:35, 28 April 2023 User account Vivse talk contribs was created automatically
08:40, 28 April 2023 User account Jepapab talk contribs was created automatically
07:34, 28 April 2023 Jmli talk contribs uploaded a new version of File:XPS Nexsa instrument.jpg (File uploaded with MsUpload)
07:32, 28 April 2023 Jmli talk contribs created page File:XPS Nexsa instrument.jpg (File uploaded with MsUpload)
07:32, 28 April 2023 Jmli talk contribs uploaded File:XPS Nexsa instrument.jpg (File uploaded with MsUpload)
14:43, 27 April 2023 User account Matmarc talk contribs was created automatically
09:45, 24 April 2023 Bghe talk contribs created page Specific Process Knowledge/Etch/ICP Metal Etcher/Examples of End point detection (Created page with "400px")
09:44, 24 April 2023 Bghe talk contribs created page File:End point of Cr down to SiO2 cut.jpg (File uploaded with MsUpload)
09:44, 24 April 2023 Bghe talk contribs uploaded File:End point of Cr down to SiO2 cut.jpg (File uploaded with MsUpload)
12:23, 20 April 2023 User account Inudoh talk contribs was created automatically
10:38, 20 April 2023 User account Zoipap talk contribs was created automatically
08:57, 20 April 2023 User account Mvad talk contribs was created automatically
15:18, 19 April 2023 User account Dagol talk contribs was created automatically
12:53, 19 April 2023 User account Hagha talk contribs was created automatically