All public logs
Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).
- 12:32, 3 February 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/DUVStepperLithography/DUVStepper (Created page with "==DUV Stepper== 300x300px|right|thumb|DUV Stepper is placed in F-3 '''Feedback to this section''': '''[mailto:labadviser@anolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/DUVStepperLithography#DUV_Stepper_FPA-3000EX4_from_Canon click here]''' The deep-UV stepper FPA-3000EX4 from Canon is an advanced exposure system designed for mass-production of 6 and...")
- 12:31, 3 February 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography//DUVStepperLithography/DUVStepper (Created page with "==DUV Stepper== 300x300px|right|thumb|DUV Stepper is placed in F-3 '''Feedback to this section''': '''[mailto:labadviser@anolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/DUVStepperLithography#DUV_Stepper_FPA-3000EX4_from_Canon click here]''' The deep-UV stepper FPA-3000EX4 from Canon is an advanced exposure system designed for mass-production of 6 and...")
- 12:26, 3 February 2023 Jehem talk contribs created page File:HMDS priming schematic.png
- 12:26, 3 February 2023 Jehem talk contribs uploaded File:HMDS priming schematic.png
- 12:20, 3 February 2023 Jehem talk contribs uploaded a new version of File:Hmds new.jpg
- 12:40, 2 February 2023 Jehem talk contribs created page File:SU8 spinCurves 2002 2005.png
- 12:40, 2 February 2023 Jehem talk contribs uploaded File:SU8 spinCurves 2002 2005.png
- 11:17, 31 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/TIspray (Created page with "{{:Specific Process Knowledge/Lithography/authors_generic}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/5214E click here]''' Resist AZ 5214E __TOC__ =Resist Description= TI Spray is specifically designed to be used for spray coating, and is a positive UV photoresist with image revers...")
- 11:01, 31 January 2023 Jehem talk contribs uploaded a new version of File:AZ photoresists spectral sensitivity - remake v1.png
- 09:39, 31 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/authors generic (Created page with "''This section is written by DTU Nanolab staff, unless otherwise stated.''")
- 10:52, 30 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Development/DUV developer (Created page with "=Developer: TMAH Stepper = 300x300px|right|thumb|The Developer-TMAH-Stepper is placed in F-3 This developer is dedicated for development of DUV resists. The developer is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with 1 developer line, in our case 2,38% TMAH in water (AZ 726 MIF), 1 topside rinse line with water, 1 backside rinse line with water and 1 N2 line f...")
- 10:28, 30 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma DUV processing (Created page with "=General Process Information= Processing using Spin Coater: Süss stepper is divided into two parts: *Spin coating *Soft baking ==Spin coating== The process of spin coating on Spin Coater: GSüss stepper consists of a selection of the following steps: *Acceleration to a low spin speed if dynamic dispense is used *Resist dispense *Spin-off The wafer is first centered on the spindle chuck and held in place by vacuum. If static dispense is specified in the process, the sp...")
- 15:35, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaDUV (Created page with "==Spin coater: Süss stepper== 300x300px|right|thumb|The SÜSS Spinner-Stepper is placed in F-3 This spinner is dedicated for spinning DUV resists. The spinner is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with the 3 resist lines (DUV42S-6, KRF M230Y, and KRF M35G), as well as a syringe dispense system. '''The user manual, quality control procedures and resul...")
- 15:21, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/labspin (Created page with "== Manual Spin Coaters == {| cellpadding="2" style="border: 2px solid darkgray;" align="right" ! width="350" | ! width="350" | ! width="350" | |- border="0" align="center" |300px |300px |300px |- align="center" | '''Spin Coater: Labspin 02''' || '''Spin Coater: Labspin 03 + fumehood 11''' || '''Spin Coater: Manual All Purpose (Decommissioned)''' |- align="center" | Loacted in w...")
- 15:04, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/RCD8 (Created page with "==Spin Coater: RCD8== 400px|thumb|Spin coater: RCD8 is located in C-1 Spin Coater: RCD8 is a model RCD8 T spin coater from Süss MicroTec with a motorized media arm and Gyrset functionality. It's primary purpose is spin coating of SU-8 resist. However, due to the possibility of using a non-vacuum chuck, the spin coater is also suitable for coating of substrates with e.g. textured backsides or membranes. '''The user manual, user APV, and c...")
- 14:57, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaEbeam (Created page with "==Spin Coater: Gamma E-beam and UV== 400px|right|thumb|Spin Coater: Gamma E-beam & UV in E-5 Spin Coater: Gamma E-beam and UV was installed at DTU Nanolab in June 2017. It is a Gamma 4M cluster from Süss MicroTec with spin coating, HMDS vapour priming, and baking modules. The system handles 2", 4", and 6" wafers without size conversion, using two separate coater stations. The 2" coater station is equipped with 1 resist line,...")
- 14:30, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaUV (Created page with "==Spin Coater: Gamma UV== 400px|right|thumb|Spin Coater: Gamma UV in E-5 '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV click here]''' ''Coater comparison table'' Spin Coater: Gamma UV was insta...")
- 15:17, 26 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/NILresist (Created page with "Here is a table with 2 different imprint resists we have recently used in the cleanroom, with links to a purchase manufactor, technical reports about resist properties and a current process flow, tested in our cleanroom. {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%" |- |- |-style="background:silver; color:black" |'''Resist''' |'''Manufacturer''' |'''Comments''' |'''Technical reports''' |'''Thinner''' |'''Spinner''' |'''Rinse''' |'''...")
- 15:12, 26 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/Ebeamresist (Created page with "== Standard E-beam resists and process guidelines == DTU Nanolab offers a limited number of standard EBL resist for our users. Our standard resist and process guidelines are summarized below. CSAR (AR-P 6200.09) is installed on Spin coater Gamma E-beam & UV for easy spin coating of 2", 4" and 6" substrates. Other substrate sizes or resist have to be used in the Labspin 2/3 coating systems. The standard resist bottles are stored in the chemical cupboard in E-4. {|borde...")
- 15:06, 26 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/DUVresist (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist/DUVresist click here]''' ==DUV resist== The spinning process will be performed by the customer together with the Photolith group of Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you. In...")
- 16:10, 25 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/UVresist (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist/UVresist click here]''' '''This section is under construction 70px''' = UV sensitive photoresist = = Exposure dose =")
- 16:07, 25 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist (Created page with "'''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist click here]''' Resist Resist =Resist= '''This section is under construction 70px'''")
- 11:26, 24 January 2023 Jehem talk contribs created page File:Lift-off process new.png (Illustration of the lift-off process.)
- 11:26, 24 January 2023 Jehem talk contribs uploaded File:Lift-off process new.png (Illustration of the lift-off process.)
- 10:46, 24 January 2023 Jehem talk contribs created page File:Imprint schematic new.png (Schematic of the hot embossing process.)
- 10:46, 24 January 2023 Jehem talk contribs uploaded File:Imprint schematic new.png (Schematic of the hot embossing process.)
- 09:09, 24 January 2023 Jehem talk contribs created page File:AZ photoresists spectral sensitivity - remake v1.png (Spectral sensitivity of AZ resists represented as optical absorption.)
- 09:09, 24 January 2023 Jehem talk contribs uploaded File:AZ photoresists spectral sensitivity - remake v1.png (Spectral sensitivity of AZ resists represented as optical absorption.)
- 08:46, 24 January 2023 Jehem talk contribs uploaded a new version of File:AZ spectral sensitivity.gif
- 08:44, 24 January 2023 Jehem talk contribs uploaded a new version of File:AZ spectral sensitivity.gif
- 08:40, 24 January 2023 Jehem talk contribs uploaded a new version of File:Hmds new.jpg
- 15:14, 3 April 2020 Jehem talk contribs uploaded File:LeicaINM100.jpg
- 12:25, 26 August 2016 Jehem talk contribs uploaded File:Hmds new.jpg
- 16:34, 25 August 2016 Jehem talk contribs uploaded File:HMDS spintrack.jpg
- 14:29, 12 August 2016 Jehem talk contribs uploaded File:HMDS2.jpg
- 13:55, 12 August 2016 Jehem talk contribs uploaded File:HMDS gammaUV.jpg
- 12:08, 12 August 2016 Jehem talk contribs uploaded File:Benchtop E5.jpg
- 12:08, 12 August 2016 Jehem talk contribs uploaded File:Benchtop C1.jpg
- 12:08, 12 August 2016 Jehem talk contribs uploaded File:Benchtop A5 2.jpg
- 12:05, 12 August 2016 Jehem talk contribs uploaded File:Benchtop A5 1.jpg
- 14:53, 10 September 2013 Jehem talk contribs uploaded a new version of File:Su8 bench.jpg
- 14:50, 10 September 2013 Jehem talk contribs uploaded File:Su8 bench.jpg
- 14:17, 13 June 2013 Jehem talk contribs uploaded File:Spin-rinser-dryer-white.jpg
