All public logs

Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).

10:27, 30 January 2023 Indiogo talk contribs uploaded File:Test samples.png
10:25, 30 January 2023 User account Mirmus talk contribs was created automatically
10:19, 30 January 2023 Thope talk contribs created page Specific Process Knowledge/Lithography/EBeamLithography/ResistBottles (Created page with "= User resist bottles in the cleanroom = 150px|right We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the guidelines below. * Find a blue-capped glass bottle in the cupboard next to office 055 in 346 (outside the cleanroom). * Bring the bottle inside gowning; clean it thoroughly '''on the outside''' with water or alcohol * Bring the bottle to a fumehood inside the cleanroom; clean the b...")
10:08, 30 January 2023 Thope talk contribs created page File:RejectedSamples.png (File uploaded with MsUpload)
10:07, 30 January 2023 Thope talk contribs uploaded File:RejectedSamples.png (File uploaded with MsUpload)
09:08, 30 January 2023 Pevo talk contribs created page File:Boron doped polySi.jpg
09:08, 30 January 2023 Pevo talk contribs uploaded File:Boron doped polySi.jpg
14:15, 28 January 2023 User account Mmnil2051 talk contribs was created automatically
15:35, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaDUV (Created page with "==Spin coater: Süss stepper== 300x300px|right|thumb|The SÜSS Spinner-Stepper is placed in F-3 This spinner is dedicated for spinning DUV resists. The spinner is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size (8" requires tool change). The machine is equipped with the 3 resist lines (DUV42S-6, KRF M230Y, and KRF M35G), as well as a syringe dispense system. '''The user manual, quality control procedures and resul...")
15:21, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/labspin (Created page with "== Manual Spin Coaters == {| cellpadding="2" style="border: 2px solid darkgray;" align="right" ! width="350" | ! width="350" | ! width="350" | |- border="0" align="center" |300px |300px |300px |- align="center" | '''Spin Coater: Labspin 02''' || '''Spin Coater: Labspin 03 + fumehood 11''' || '''Spin Coater: Manual All Purpose (Decommissioned)''' |- align="center" | Loacted in w...")
15:04, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/RCD8 (Created page with "==Spin Coater: RCD8== 400px|thumb|Spin coater: RCD8 is located in C-1 Spin Coater: RCD8 is a model RCD8 T spin coater from Süss MicroTec with a motorized media arm and Gyrset functionality. It's primary purpose is spin coating of SU-8 resist. However, due to the possibility of using a non-vacuum chuck, the spin coater is also suitable for coating of substrates with e.g. textured backsides or membranes. '''The user manual, user APV, and c...")
14:57, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaEbeam (Created page with "==Spin Coater: Gamma E-beam and UV== 400px|right|thumb|Spin Coater: Gamma E-beam & UV in E-5 Spin Coater: Gamma E-beam and UV was installed at DTU Nanolab in June 2017. It is a Gamma 4M cluster from Süss MicroTec with spin coating, HMDS vapour priming, and baking modules. The system handles 2", 4", and 6" wafers without size conversion, using two separate coater stations. The 2" coater station is equipped with 1 resist line,...")
14:33, 27 January 2023 Kabi talk contribs created page File:Maskordering in Fusion.pdf
14:33, 27 January 2023 Kabi talk contribs uploaded File:Maskordering in Fusion.pdf
14:30, 27 January 2023 Kabi talk contribs created page File:Mask Ordering Guide.pdf
14:30, 27 January 2023 Kabi talk contribs uploaded File:Mask Ordering Guide.pdf
14:30, 27 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Coaters/GammaUV (Created page with "==Spin Coater: Gamma UV== 400px|right|thumb|Spin Coater: Gamma UV in E-5 '''Feedback to this section''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV click here]''' ''Coater comparison table'' Spin Coater: Gamma UV was insta...")
12:53, 27 January 2023 Bghe talk contribs created page File:Contour Plot etch rates SRN.jpg (File uploaded with MsUpload)
12:53, 27 January 2023 Bghe talk contribs uploaded File:Contour Plot etch rates SRN.jpg (File uploaded with MsUpload)
12:53, 27 January 2023 Bghe talk contribs created page File:Contour Plot etch rates SiO2.jpg (File uploaded with MsUpload)
12:53, 27 January 2023 Bghe talk contribs uploaded File:Contour Plot etch rates SiO2.jpg (File uploaded with MsUpload)
12:53, 27 January 2023 Bghe talk contribs created page File:Contour Plot etch rates Si3N4.jpg (File uploaded with MsUpload)
12:53, 27 January 2023 Bghe talk contribs uploaded File:Contour Plot etch rates Si3N4.jpg (File uploaded with MsUpload)
12:53, 27 January 2023 Bghe talk contribs created page File:Contour Plot etch rates Si.jpg (File uploaded with MsUpload)
12:53, 27 January 2023 Bghe talk contribs uploaded File:Contour Plot etch rates Si.jpg (File uploaded with MsUpload)
15:17, 26 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/NILresist (Created page with "Here is a table with 2 different imprint resists we have recently used in the cleanroom, with links to a purchase manufactor, technical reports about resist properties and a current process flow, tested in our cleanroom. {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%" |- |- |-style="background:silver; color:black" |'''Resist''' |'''Manufacturer''' |'''Comments''' |'''Technical reports''' |'''Thinner''' |'''Spinner''' |'''Rinse''' |'''...")
15:12, 26 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/Ebeamresist (Created page with "== Standard E-beam resists and process guidelines == DTU Nanolab offers a limited number of standard EBL resist for our users. Our standard resist and process guidelines are summarized below. CSAR (AR-P 6200.09) is installed on Spin coater Gamma E-beam & UV for easy spin coating of 2", 4" and 6" substrates. Other substrate sizes or resist have to be used in the Labspin 2/3 coating systems. The standard resist bottles are stored in the chemical cupboard in E-4. {|borde...")
15:06, 26 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/DUVresist (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist/DUVresist click here]''' ==DUV resist== The spinning process will be performed by the customer together with the Photolith group of Nanolab. In case you would like to do DUV lithography please contact Lithography team, who will consult you and run your wafers together with you. In...")
14:43, 26 January 2023 Thope talk contribs uploaded a new version of File:EBLWorkflow.png (File uploaded with MsUpload)
14:28, 26 January 2023 Thope talk contribs created page File:EBLWorkflow.png (File uploaded with MsUpload)
14:28, 26 January 2023 Thope talk contribs uploaded File:EBLWorkflow.png (File uploaded with MsUpload)
14:26, 26 January 2023 Pevo talk contribs created page Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si (Created page with " ==Results from the acceptance test 2012== {| border="2" cellspacing="1" cellpadding="8" !Recipe name !Deposition rate [nm/min] !Refractive index@630nm !Thickness variation on center wafer !Thickness variation along the boat !Surface roughness [nm] !Sheet resistance [Ohms/square] !Boron concentation [boron atoms/cm3] !Comments |- |"DOPEPOLY" |~ 4.0-4.1 (4" wafers) | 1.29%-1.38% (4" wafers) | 1.63%-1.81% (4" wafers) | |~ 4.83, measured with AFM standard tip...")
16:10, 25 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/UVresist (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist/UVresist click here]''' '''This section is under construction 70px''' = UV sensitive photoresist = = Exposure dose =")
16:07, 25 January 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist (Created page with "'''Feedback to this page''': '''[mailto:photolith@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Resist click here]''' Resist Resist =Resist= '''This section is under construction 70px'''")
14:57, 25 January 2023 Indiogo talk contribs uploaded a new version of File:Set up.png
14:57, 25 January 2023 Indiogo talk contribs uploaded a new version of File:Set up.png
14:40, 25 January 2023 Indiogo talk contribs created page File:Set up.png
14:40, 25 January 2023 Indiogo talk contribs uploaded File:Set up.png
13:34, 25 January 2023 Thope talk contribs created page Specific Process Knowledge/Lithography/EBeamLithography/EBLLandingpage (Created page with "E-Beam Lithography at DTU Nanolab")
14:13, 24 January 2023 Indiogo talk contribs created page Specific Process Knowledge/Thermal Process/RTP Annealsys (Created page with "=THIS PAGE IS UNDER CONSTRUCTION500px=")
14:11, 24 January 2023 Indiogo talk contribs created page Specific Process Knowledge/Thermal Process/RTP ANNEALSYS (Created page with "=THIS PAGE IS UNDER CONSTRUCTION550px=")
13:53, 24 January 2023 Thope talk contribs created page File:MGN3.png
13:53, 24 January 2023 Thope talk contribs uploaded File:MGN3.png
13:49, 24 January 2023 Thope talk contribs created page File:MGN2.png
13:49, 24 January 2023 Thope talk contribs uploaded File:MGN2.png
13:42, 24 January 2023 Thope talk contribs created page Specific Process Knowledge/Lithography/EBeamLithography/JEOL JBX-9500FSZ/SDFJDFIntro (Created page with "= Job file preparation for JEOL 9500 = == Introduction == In order to write a pattern with the e-beam system you will have to generate a set of job files. These files are essentially a set of instructions which tell the system what pattern to write, where to place each pattern along with specific writing conditions, exposure dose, alignment conditions and calibration conditions. Apart from this you will naturally also have to generate the pattern you wish to expose....")
11:26, 24 January 2023 Jehem talk contribs created page File:Lift-off process new.png (Illustration of the lift-off process.)
11:26, 24 January 2023 Jehem talk contribs uploaded File:Lift-off process new.png (Illustration of the lift-off process.)
10:46, 24 January 2023 Jehem talk contribs created page File:Imprint schematic new.png (Schematic of the hot embossing process.)
10:46, 24 January 2023 Jehem talk contribs uploaded File:Imprint schematic new.png (Schematic of the hot embossing process.)