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- 11:54, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography/E-beam exposure (content was: "Due to the high maintenance cost, Only the Danchip operators are allowed to loading the cassette to the e beam writer. The starting point is a L-Edit file (*.tba). *The first step is to convert this L-Edit file to *.gds. *Then you ex...")
- 11:53, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography/What resist to choose (content was: "===Positive tone resist=== ZEP520A is the most popular used E-beam resist. It is a positive resist with high resolution (better than 30nm). If you need a negative tone pattern, the normal procedure is to use the lift-off process( with ...")
- 11:53, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography/PMMA (content was: "PMMA950K is a positive tone e beam resist. it has good resolution (better than 20nm), low sensitivity (around 500uc/cm2 at 100kv). peer dry etch resistance (around 3t..." (and the only contributor was "Pxshi"))
- 11:53, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography/E-beaming (content was: "for the e beam lithograph, the users should prepare their pattern data in the gds format. it is then converted either by the software called layout beamer (in the pc at e..." (and the only contributor was "Elk"))
- 11:52, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography/Lift-off e-beam resist (content was: "==Aluminium lift-off with zep520A resist== Procedure: #After developing the zep520A resist the first step is to deposit aluminium. The best way to do this is by...")
- 11:50, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography (content before blanking was: "300x300px|thumb| The JEOL JBX-9500 electron beam lithography system is a spot electron beam type lithography system designed for writing patterns with dimensions from nanometers to sub-micrometers. Th...")
- 11:22, 28 May 2015 Bghe talk contribs deleted page Multisource PVD (content was: "== New PVD equipment == See further PVD co-sputter/evaporation ''Cyrofox Exployer 700 Flex bought from..." (and the only contributor was "Kn"))
- 11:14, 28 May 2015 Bghe talk contribs deleted page Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300 (content before blanking was: "='''THIS PAGE IS UNDER CONSTRUCTION'''= ==IBE/IBSD Ionfab 300: milling, dry etching and deposition in the same tool== IBE: Ion Beam Etch IBSD: Ion Beam Sputter Deposition This Ionfab300 from Oxford Instruments is cab...")
- 11:11, 28 May 2015 Bghe talk contribs deleted page Advanced Silicon Etcher - Pegasus (content was: "SPTS Pegasus user manual can now be found here >HERE< Here you can find some Information on the new STS Pegasus Si Etcher ..." (and the only contributor was "Roycork"))
- 11:09, 28 May 2015 Bghe talk contribs deleted page III-V Materials ICP Etcher (content was: "SPTS ICP III-V Materials Etcher user manual can now be found here >HERE< Here you can find some Information on the n..." (and the only contributor was "Roycork"))
- 11:08, 28 May 2015 Bghe talk contribs deleted page Advanced Metal Etcher (content was: "SPTS ICP Metal Etcher user manual can now be found here >HERE< Here you can find some Information on the new STS ICP Metal..." (and the only contributor was "Roycork"))
- 10:54, 28 May 2015 Bghe talk contribs deleted page Process Specific Knowledge/Photolithography/AZ5214E diluted positive resist (content before blanking was: "#REDIRECT Specific Process Knowledge/Photolithography/AZ5214E diluted positive resist")
- 10:53, 28 May 2015 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etch of Silicon Nitride using RIE (content was: "For a general introduction to RIE at Danchip see RIE (Reactive Ion Etch) Etching of silicon nitride using RIE can be done with several recipes. It can be etched by o..." (and the only contributor was "BGE"))
- 10:52, 28 May 2015 Bghe talk contribs deleted page Components (content was: "== Components== test")
- 12:54, 27 May 2015 Bghe talk contribs uploaded File:Monthly LabAdviser update 20150527.docx (MsUpload)
- 12:38, 12 May 2015 Bghe talk contribs uploaded File:15min+30min5.jpg (MsUpload)
- 12:37, 12 May 2015 Bghe talk contribs uploaded File:Edge 1.jpg (MsUpload)
- 12:37, 12 May 2015 Bghe talk contribs uploaded File:After IBE 45min A 34.jpg (MsUpload)
- 12:36, 12 May 2015 Bghe talk contribs uploaded File:IBE 30min -Cr1.jpg (MsUpload)
- 12:29, 12 May 2015 Bghe talk contribs uploaded File:IBE 30min -Cr1.tif (MsUpload)
- 12:28, 12 May 2015 Bghe talk contribs uploaded File:After IBE 45min A 33.tif (MsUpload)
- 12:27, 12 May 2015 Bghe talk contribs uploaded File:15min+30min4.tif (MsUpload)
- 12:26, 12 May 2015 Bghe talk contribs uploaded File:Edge 1.tif (MsUpload)
- 12:26, 12 May 2015 Bghe talk contribs uploaded File:Edge 0.tif (MsUpload)
- 10:46, 20 April 2015 Bghe talk contribs uploaded File:Tooling factor.jpg
- 11:20, 17 April 2015 Bghe talk contribs uploaded File:Monthly LabAdviser update 20150417.docx
- 11:10, 17 April 2015 Bghe talk contribs uploaded File:AFM Re-training 2015 v2.pdf
- 11:09, 17 April 2015 Bghe talk contribs uploaded File:AFM Re-training 2015.pdf
- 11:08, 17 April 2015 Bghe talk contribs deleted page File:AFM Re-training 2015.pdf
- 11:07, 17 April 2015 Bghe talk contribs uploaded a new version of File:AFM Re-training 2015.pdf
- 11:02, 17 April 2015 Bghe talk contribs uploaded a new version of File:AFM Re-training 2015.pdf
- 10:06, 7 April 2015 Bghe talk contribs uploaded File:AFM Re-training 2015.pdf
- 13:04, 20 March 2015 Bghe talk contribs uploaded File:Monthly LabAdviser update 20150320 2.docx
- 13:02, 20 March 2015 Bghe talk contribs uploaded a new version of File:Monthly LabAdviser update 20150320.docx
- 12:59, 20 March 2015 Bghe talk contribs uploaded File:Monthly LabAdviser update 20150320.docx
- 12:58, 20 March 2015 Bghe talk contribs deleted page File:Monthly LabAdviser update 20150320.docx
- 12:58, 20 March 2015 Bghe talk contribs deleted page File:Monthly LabAdviser update 20150320.docx (Deleted old revision 20150320105653!Monthly_LabAdviser_update_20150320.docx)
- 12:56, 20 March 2015 Bghe talk contribs uploaded a new version of File:Monthly LabAdviser update 20150320.docx
- 12:55, 20 March 2015 Bghe talk contribs deleted page File:Monthly LabAdviser update 20150320.docx (Deleted old revision 20150320105257!Monthly_LabAdviser_update_20150320.docx)
- 12:54, 20 March 2015 Bghe talk contribs deleted page File:Monthly LabAdviser update 20150320.docx (Deleted old revision 20150320105441!Monthly_LabAdviser_update_20150320.docx)
- 12:54, 20 March 2015 Bghe talk contribs uploaded a new version of File:Monthly LabAdviser update 20150320.docx
- 12:52, 20 March 2015 Bghe talk contribs uploaded a new version of File:Monthly LabAdviser update 20150320.docx
- 12:49, 20 March 2015 Bghe talk contribs uploaded File:Monthly LabAdviser update 20150320.docx
- 11:46, 25 February 2015 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/III-V_Process click here]''' This entry has been merged with ...")
- 11:43, 25 February 2015 Bghe talk contribs deleted page Specific Process Knowledge/temp (content before blanking was: "==Overview of sample processing 3== {| {{Table}} |- valign="top" | {| class="wikitable collapsible collapsed" border="1" cellspacing="1" cellpadding="2" align="left" ! image:Clean your sample.png|thumb|100px|Clean y...")
- 10:53, 20 February 2015 Bghe talk contribs uploaded File:Monthly LabAdviser update 20150220.docx
- 15:45, 16 January 2015 Bghe talk contribs uploaded File:Monthly LabAdviser update 20150116.docx
- 15:01, 18 December 2014 Bghe talk contribs uploaded File:DUV6.jpg
- 15:08, 11 December 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/characterisation/III-V ECV-profiler (Moved to characterization)
- 15:03, 11 December 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/characterisation/X-Ray Diffractometer (Moved to characterization)