Main public logs

Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).

16:28, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300/IBE Ti etch (content before blanking was: "==Results from the acceptance test in February 2011== '''Acceptance test for Ti etch:''' {| border="2" cellspacing="0" cellpadding="2" |- !style="background:silver; color:black;" align="left"|. |style="background:WhiteS...")
16:27, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/IBE/IBSD Ionfab 300/IBE Au etch (content before blanking was: "==Results from the acceptance test in February 2011== '''Acceptance test for Au etch:''' {| border="2" cellspacing="0" cellpadding="2" |- !style="background:silver; color:black;" align="left"|. |style="background:WhiteS...")
16:26, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of polymer/Etch of Photo Resist using RIE (content was: "jklkjljkl" (and the only contributor was "BGE"))
16:21, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy/FEI/gallery/LoVac/TOPAS (content was: "== Images of TOPAS == === Purpose === TOPAS cantilevers have been made by e-beam lithography and mounted on a SU8 chip. The purpose is a general verification of the process. === How to approach the challenge on the FEI SEM === * Mount...")
16:20, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy/FEI/gallery/HiVac/bge al poly (content was: "== Images of aluminium on polysilicon == === Purpose === To check if the liftoff process with aluminium on e-beam defined nanostructures is ok. === How to approach the ..." (and the only contributor was "Jml"))
16:20, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy/FEI/gallery/LoVac/SU8 (content was: "== Image of SU8 == === Purpose === To check if the SU8 is ok. === How to approach the challenge on the FEI SEM === 370x370px|thumb|left|" (and the only contributor was "Jml"))
16:19, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/Measurement of optical constants (content was: "Measurement if the optical constants of a thin film is measured together with the thickness of the film either by ellipsometry (using the ellipsometer), by refraction (u..." (and the only contributor was "BGE"))
16:19, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/Hydrophobicity measurement (content was: "Drop Shape Analyzer" (and the only contributor was "Jml"))
16:16, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Back-end processing/ (content was: "'''Feedback to this page''': '''[mailto:danchipsupport@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Kn..." (and the only contributor was "Kabi"))
16:15, 22 April 2014 Bghe talk contribs deleted page Solar cell process flow (content was: "<!-- This page is under construction, and far from finished. (Some things might even be compleatly wrong, while we are constructing the page) '''Feedback to this page''..." (and the only contributor was "Pvl"))
16:15, 22 April 2014 Bghe talk contribs deleted page Silicon nitride (content was: "== Etch of Silicon Nitride == Silicon nitride can be etched using either wet chemistry or dry etch equipment. Wet chemistry is mainly used to remove all the nitride on the surface (backside and frontside) of a wafer. Dry etching etches ...")
16:14, 22 April 2014 Bghe talk contribs deleted page Sandbox (content was: "test test test" (and the only contributor was "AndersF"))
16:14, 22 April 2014 Bghe talk contribs deleted page Sandblasting (content was: "=Sandblasting= Sandblasting is a very fast way of structuring glass and can be used for e.g. making inlet holes in glass substrates for microfluidic devices. The s..." (and the only contributor was "Jehan"))
16:13, 22 April 2014 Bghe talk contribs deleted page Roughness of TiW (content before blanking was: "== Roughness, grain size and uniformity of TiW layers == For the sputter process, the effect and argon pressure can be set to different values. Depending on the process parameters, the deposited layers will have differen...")
16:12, 22 April 2014 Bghe talk contribs deleted page Roughness, grain size and uniformity of TiW layers (content was: "For the sputter process, the effect and argon pressure can be set to different values. Depending on the process parameters, the deposited layers will have different charact..." (and the only contributor was "Kn"))
16:11, 22 April 2014 Bghe talk contribs deleted page Process SPecific Knowledge/Photolithography/AZ5214E diluted positive resist (content was: "==Pretreatment== {{testtemplate}} ==Spinning== ==Baking== ==Exposure== ==Developing==")
16:11, 22 April 2014 Bghe talk contribs deleted page Process Flow (content before blanking was: "*alignercheck *Hvad er på skiven fra start? **DSP Skiver m nitrid og poly *proces to check you bottomaligning *alignercheck *Hvad er på skiven fra start? **DSP Skiver m nitrid og poly # HMDS # PR1_5 bagside...")
16:11, 22 April 2014 Bghe talk contribs deleted page Polishing machine (content was: "Details will come by the end of 2012. See LabManager for now. /Jesper Hanberg" (and the only contributor was "Jehan"))
16:10, 22 April 2014 Bghe talk contribs deleted page Packaging (content was: "== Choose an equipment == *Wire bonder(s) *Anodic bonder (EVG 520 Hot Embosser) *Wafer scriber *Saw *Polishing machine")
16:09, 22 April 2014 Bghe talk contribs deleted page Old equipment for decommissioning (content was: " {| border="2" cellspacing="2" cellpadding="3" | align="center" style="background:#f0f0f0;"|''' Equipment''' | align="center" style="background:#f0f0f0;"|''' Supplier ''' | align="center" style="background:#f0f0f0;"|''' Expected out of ...")
16:09, 22 April 2014 Bghe talk contribs deleted page New equipment in the pipeline/Ion Beam Etch and Deposition Tool (content was: "==Oxford Ionfab300plus: Ion Beam Etch and Deposition Tool== We have ordered an [http://www.oxford-instruments.com/products/etching-deposition-growth/tools/tools/ionfab-3..." (and the only contributor was "BGE"))
16:08, 22 April 2014 Bghe talk contribs deleted page New equipment in the pipeline (content was: "Here is presented an overview of the various pieces of equipment in the pipeline for the DTU Danchip facility. <br> {| border="2" cellspacing="2" cellpadding="3" | align="center" style="background:#f0f0f0;"|''' Equipment''' | align="ce...")
16:07, 22 April 2014 Bghe talk contribs deleted page Material to be etched (content was: "== Choose material to be etched == *Aluminium *Chromium *Gold *Polymer *Silicon *Silicon nitride *Silicon oxide *Titanium" (and the only contributor was "BGE"))
16:06, 22 April 2014 Bghe talk contribs deleted page Main Page/Specific Process Knowledge/Process flow approval (content was: "== Process Flow Approval == === Why do process flows need to be reviewed === Before implementing process flows in the DTU Danchip cleanroom facilities, the process needs ..." (and the only contributor was "Tg"))
16:05, 22 April 2014 Bghe talk contribs deleted page LabAdviser/LabAdviser Updates (content was: "Each month a list of resent updates in LabAdviser is created and send to the cleanroom users. This is to give the users an update on the pages that are edited an easy-to..." (and the only contributor was "BGE"))
16:04, 22 April 2014 Bghe talk contribs deleted page LabAdviser/Introduction to LabAdviser and Processing/LabAdviser Structure (content was: "image:LabAdviser structure.jpg|1000px|This image gives an idea of the page tree structure in LabAdviser and also an idea of the thoughts behind the structure. The quest..." (and the only contributor was "BGE"))
16:02, 22 April 2014 Bghe talk contribs deleted page How to ad information to LabAdvisor (content was: "===Purpose of the LabAdvisor - sharing of knowledge=== The purpose of LabAdvisor is sharing of knowledge. In our laboratory thousands of experiments have been made and we..." (and the only contributor was "BGE"))
16:01, 22 April 2014 Bghe talk contribs deleted page Hardware Information (Supplied by STS) (content was: "Image:Example.jpg" (and the only contributor was "Roycork"))
16:01, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy/FEI/gallery/HiVac/bgeAlPoly (content was: "== Images of aluminium on polysilicon == === Purpose === To check if the liftoff process with aluminium on e-beam defined nanostructures is ok. === How to approach the ..." (and the only contributor was "Jml"))
15:59, 22 April 2014 Bghe talk contribs deleted page Etching of Silicon Nitride (content was: "Silicon nitride can be etched using either wet chemistry or dry etch equipment. Wet chemistry is mainly used to remove all the nitride on the surface (b..." (and the only contributor was "192.38.87.76"))
15:58, 22 April 2014 Bghe talk contribs deleted page Bge al poly (content was: "== Images of aluminium on polysilicon == === Purpose === To check if the liftoff process with aluminium on e-beam defined nanostructures is ok. === How to approach the ..." (and the only contributor was "Jml"))
15:57, 22 April 2014 Bghe talk contribs deleted page Etch/Etching of Aluminium (content was: "Etching of Aluminium can be done using our wet." (and the only contributor was "192.38.87.76"))
15:57, 22 April 2014 Bghe talk contribs deleted page Etch (content was: "== Choose material to be etched == *Aluminium *Chromium *Titanium *Gold *Platin *Polymer *Etchi...")
15:49, 22 April 2014 Bghe talk contribs deleted page ALD Picosun R200 (content was: " =ALD Picosun 200= '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/ALD..." (and the only contributor was "Pevo"))
15:46, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/III V thermal processes/Jipelec RTP (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/III-V_Process/III_V_thermal_processes/Jipelec_RTP click her...")
15:45, 22 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Bulk Glass/Deep Wet Etch in Glass (content was: "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledg..." (and the only contributor was "BGE"))
11:28, 11 April 2014 Bghe talk contribs uploaded File:Monthly LabAdviser update 20140411.docx
16:47, 19 March 2014 Bghe talk contribs uploaded File:PECVD2 SiO2 Test20 wafer map.jpg
16:24, 14 March 2014 Bghe talk contribs uploaded File:Monthly LabAdviser update 20140314.docx
17:09, 17 February 2014 Bghe talk contribs uploaded File:Monthly LabAdviser update 20140217.docx
12:16, 17 February 2014 Bghe talk contribs uploaded File:AOE slow 20140201 10.jpg
12:04, 17 February 2014 Bghe talk contribs uploaded File:AOE slow contour plot 20140201.jpg
11:08, 17 February 2014 Bghe talk contribs uploaded File:ICP metal slow s4075 sio2 6.jpg
11:07, 17 February 2014 Bghe talk contribs uploaded File:ICP metal slow s4075 sio2 4.jpg
11:05, 17 February 2014 Bghe talk contribs uploaded File:ICP metal resist no etch s4075 2.jpg
11:00, 17 February 2014 Bghe talk contribs uploaded File:ICP metal resist no etch 2.tif
10:41, 17 February 2014 Bghe talk contribs uploaded File:ICP metal slow wafer uniformity s4075.jpg
14:18, 27 January 2014 Bghe talk contribs uploaded File:Cleanroom naming 2014.jpg
12:00, 23 January 2014 Bghe talk contribs uploaded File:AOE slow contour plot1.jpg
09:48, 23 January 2014 Bghe talk contribs uploaded File:Plasma Asher SiO2 etch rate contour plot test2.jpg