Upload log
Below is a list of the most recent file uploads. See the gallery of new files for a more visual overview.
- 15:54, 17 October 2011 Kn talk contribs uploaded File:Si spectra Labadvisor.pdf (XPS spectra of SiO)
- 15:14, 15 September 2011 Mdyma talk contribs uploaded File:Oxide thickness vs time Dry oxygen 111.JPG (Figure Oxide thickness vs. time. Dry oxygen on <111> wafer)
- 15:13, 15 September 2011 Mdyma talk contribs uploaded File:Oxide thickness vs time Dry oxygen 100.JPG (Figure Oxide thickness vs time. Dry oxygen <100>)
- 14:43, 15 September 2011 Kn talk contribs uploaded File:Cryofox maskine.JPG (Picture of the PVD co-sputter/evaporation or cryofox machine.)
- 10:55, 15 September 2011 Kn talk contribs uploaded File:Stochiometry 20110510.JPG (Atomic % Ni and Cr in a NiCr wafer depsotited with settings described on the page about NiCr alloy.)
- 13:41, 21 July 2011 BGE talk contribs uploaded File:IBE acceptance Ti S10-5.jpg
- 13:40, 21 July 2011 BGE talk contribs uploaded File:IBE acceptance Ti S10-4.jpg
- 13:39, 21 July 2011 BGE talk contribs uploaded File:IBE acceptance Ti S7 5.jpg
- 10:04, 21 July 2011 BGE talk contribs uploaded File:IBE acceptance S18-AU-ZEP5.jpg
- 10:03, 21 July 2011 BGE talk contribs uploaded File:IBE accpetance S18-AU-ZEP3.jpg
- 14:48, 13 July 2011 BGE talk contribs uploaded a new version of File:AOE oxide etch after 150dg pretreated resist.jpg
- 14:47, 13 July 2011 BGE talk contribs uploaded a new version of File:AOE oxide etch after 150dg pretreated resist.jpg
- 14:46, 13 July 2011 BGE talk contribs uploaded a new version of File:AOE oxide etch after 150dg pretreated resist.jpg
- 14:45, 13 July 2011 BGE talk contribs uploaded a new version of File:AOE oxide etch after 150dg pretreated resist.jpg
- 14:44, 13 July 2011 BGE talk contribs uploaded File:AOE oxide etch after 150dg pretreated resist.jpg
- 14:31, 13 July 2011 BGE talk contribs uploaded File:AOE resist after oxide etch pre150dg.jpg
- 14:10, 13 July 2011 BGE talk contribs uploaded File:AOE resist after oxide etch.jpg
- 14:08, 13 July 2011 BGE talk contribs uploaded a new version of File:AOE resist efter oxydæts.jpg
- 14:07, 13 July 2011 BGE talk contribs uploaded File:AOE resist efter oxydæts.jpg
- 15:32, 1 July 2011 Jehan talk contribs uploaded a new version of File:Mask spec.doc
- 15:30, 1 July 2011 Jehan talk contribs uploaded File:Mask spec.doc
- 13:45, 24 June 2011 Jml talk contribs uploaded File:DRIE-Pegasus.jpg (The SPTS DRIE-Pegasus )
- 12:33, 23 June 2011 Jml talk contribs uploaded File:Boostdelay4b.jpg (The splitting on the etch cycle on the Pegasus into three parts: Boost, Delay and Main)
- 08:49, 7 June 2011 Jehan talk contribs uploaded File:Process flow template (rename to .dotx).docx
- 12:25, 19 May 2011 Jml talk contribs uploaded File:WF 2E09b mar23 2011-150.jpg (Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees)
- 12:24, 19 May 2011 Jml talk contribs uploaded File:WF 2E09b mar23 2011-120.jpg (Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees)
- 12:24, 19 May 2011 Jml talk contribs uploaded File:WF 2E09b mar23 2011-090.jpg (Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees)
- 12:24, 19 May 2011 Jml talk contribs uploaded File:WF 2E09b mar23 2011-060.jpg (Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees)
- 12:24, 19 May 2011 Jml talk contribs uploaded File:WF 2E09b mar23 2011-030.jpg (Etching of nanostructures in Si using ASE: pxnano2 recipe, time 96 secs (12 cycles), temp 20 degrees)
- 12:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-150.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 12:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-120.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 12:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-090.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 12:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-060.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 12:23, 19 May 2011 Jml talk contribs uploaded File:WF 2E09a mar23 2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2150, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 09:30, 9 May 2011 Jml talk contribs uploaded File:WF 2E08b 23mar2011-150.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
- 09:30, 9 May 2011 Jml talk contribs uploaded File:WF 2E08b 23mar2011-120.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08b 23mar2011-090.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08b 23mar2011-060.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08b 23mar2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.43 recipe, Run ID 2018, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/30 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08a 23mar2011-150.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08a 23mar2011-120.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 09:29, 9 May 2011 Jml talk contribs uploaded File:WF 2E08a 23mar2011-090.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 09:28, 9 May 2011 Jml talk contribs uploaded File:WF 2E08a 23mar2011-060.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 09:28, 9 May 2011 Jml talk contribs uploaded File:WF 2E08a 23mar2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.42 recipe, Run ID 2017, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/40 coil/platen, -20 degs.)
- 12:44, 29 April 2011 Jml talk contribs uploaded File:WF 2E07b mar23 2011-150.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.41 recipe, Run ID 2001, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/75 coil/platen, -20 degs.)
- 12:44, 29 April 2011 Jml talk contribs uploaded File:WF 2E07b mar23 2011-120.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.41 recipe, Run ID 2001, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/75 coil/platen, -20 degs.)
- 12:43, 29 April 2011 Jml talk contribs uploaded File:WF 2E07b mar23 2011-090.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.41 recipe, Run ID 2001, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/75 coil/platen, -20 degs.)
- 12:43, 29 April 2011 Jml talk contribs uploaded File:WF 2E07b mar23 2011-060.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.41 recipe, Run ID 2001, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/75 coil/platen, -20 degs.)
- 12:43, 29 April 2011 Jml talk contribs uploaded File:WF 2E07b mar23 2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.41 recipe, Run ID 2001, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/75 coil/platen, -20 degs.)
- 12:43, 29 April 2011 Jml talk contribs uploaded File:WF 2E07a mar23 2011-150.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.)
