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Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).

• 13:31, 13 July 2011 BGE talk contribs uploaded File:AOE resist after oxide etch pre150dg.jpg
• 13:10, 13 July 2011 BGE talk contribs uploaded File:AOE resist after oxide etch.jpg
• 13:08, 13 July 2011 BGE talk contribs uploaded a new version of File:AOE resist efter oxydæts.jpg
• 13:07, 13 July 2011 BGE talk contribs uploaded File:AOE resist efter oxydæts.jpg
• 07:44, 28 April 2011 BGE talk contribs changed group membership for Jehan from danchip to danchip, administrator and bureaucrat
• 09:12, 3 December 2010 BGE talk contribs uploaded File:BGE GLass etch Cr50Au400n1 pinholes 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
• 09:12, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 04.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
• 09:11, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 03.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
• 09:11, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 02.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
• 09:10, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 01.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
• 09:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
• 09:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 04.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
• 09:08, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 03.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
• 09:08, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 02.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
• 09:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 01.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
• 08:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 4.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
• 08:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 3.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
• 08:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 2.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
• 08:06, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 1.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
• 08:06, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 6.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
• 16:00, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 05.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
• 16:00, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 04.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
• 15:59, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 03.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
• 15:59, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 02.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
• 15:58, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 01.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
• 16:12, 15 November 2010 BGE talk contribs uploaded File:AOE act neg resist profile.jpg
• 16:04, 15 November 2010 BGE talk contribs uploaded File:AOE act neg 2 A.jpg
• 12:18, 15 June 2010 BGE talk contribs changed group membership for Sst from (none) to fotonik
• 14:13, 1 June 2010 BGE talk contribs changed group membership for Yud from (none) to fotonik
• 10:50, 19 May 2010 BGE talk contribs changed group membership for Meno from danchip and administrator to danchip, administrator and bureaucrat
• 10:50, 19 May 2010 BGE talk contribs changed group membership for Meno from danchip to danchip and administrator
• 15:15, 18 May 2010 BGE talk contribs changed group membership for ZD from (none) to nanotech
• 13:48, 5 May 2010 BGE talk contribs changed group membership for Fibo from (none) to nanotech
• 10:46, 12 March 2010 BGE talk contribs changed group membership for Tal from (none) to danchip
• 17:50, 1 March 2010 BGE talk contribs changed group membership for Xucu from (none) to nanotech
• 14:03, 15 February 2010 BGE talk contribs changed group membership for Seo from (none) to nanotech
• 12:07, 12 February 2010 BGE talk contribs changed group membership for Rebe from (none) to nanotech
• 13:14, 2 February 2010 BGE talk contribs changed group membership for Krm from danchip to nanotech
• 14:20, 9 November 2009 BGE talk contribs uploaded File:Lesker Impedance Bjarke.png
• 13:56, 9 November 2009 BGE talk contribs uploaded File:Lesker roughness Bjarke.JPG
• 11:28, 2 November 2009 BGE talk contribs changed group membership for Jah from (none) to nanotech
• 14:02, 28 October 2009 BGE talk contribs changed group membership for Mbc from (none) to nanotech
• 10:14, 28 October 2009 BGE talk contribs changed group membership for Btd from (none) to nanotech
• 12:15, 6 October 2009 BGE talk contribs changed group membership for Dm from (none) to industry
• 11:59, 28 September 2009 BGE talk contribs changed group membership for Cjlu from (none) to nanotech
• 09:40, 31 July 2009 BGE talk contribs changed group membership for Nibl from (none) to dtu
• 11:49, 17 June 2009 BGE talk contribs changed group membership for Jiy from (none) to nanotech
• 13:28, 15 June 2009 BGE talk contribs changed group membership for And from (none) to nanotech
• 08:01, 11 June 2009 BGE talk contribs changed group membership for Avl from (none) to nanotech
• 12:41, 8 June 2009 BGE talk contribs changed group membership for Mbo from (none) to nanotech