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• 14:50, 15 March 2011 Jml talk contribs uploaded File:WF2A-6-feb06-2011-090nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.5 recipe, Run ID 438 and 440, time 120 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:50, 15 March 2011 Jml talk contribs uploaded File:WF2A-6-feb06-2011-060nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.5 recipe, Run ID 438 and 440, time 120 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:50, 15 March 2011 Jml talk contribs uploaded File:WF2A-6-feb06-2011-030nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.5 recipe, Run ID 438 and 440, time 120 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)
• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)
• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)
• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)
• 14:49, 15 March 2011 Jml talk contribs uploaded File:WF 2B5 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.4 recipe, Run ID 431, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/90 coil/platen, 20 degs.)
• 14:48, 15 March 2011 Jml talk contribs uploaded File:WF 2B4 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)
• 14:47, 15 March 2011 Jml talk contribs uploaded File:WF 2B4 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)
• 14:47, 15 March 2011 Jml talk contribs uploaded File:WF 2B4 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)
• 14:47, 15 March 2011 Jml talk contribs uploaded File:WF 2B4 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)
• 14:47, 15 March 2011 Jml talk contribs uploaded File:WF 2B4 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 430 and 432, time 180 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)
• 14:46, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:46, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:45, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:45, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:45, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)
• 14:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:42, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:42, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
• 14:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
• 13:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
• 13:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
• 13:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
• 13:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
• 13:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
• 10:16, 25 February 2011 Jml talk contribs uploaded File:Crystalbond2.jpg (Problems with crystalbond on Pegasus: A wafer bonded to a carrier has slided off during process.)
• 15:16, 23 February 2011 Jml talk contribs uploaded File:WF 2F-6 dec092010-30 nm.jpg (ICP metal etcher: Starting point for development of Si nano etch recipe.)
• 15:16, 23 February 2011 Jml talk contribs uploaded File:WF 2F-6 dec092010-120 nm.jpg (ICP metal etcher: Starting point for development of Si nano etch recipe.)
• 11:05, 20 October 2010 Jml talk contribs changed group membership for Tg from danchip and administrator to danchip, administrator and bureaucrat
• 11:05, 20 October 2010 Jml talk contribs changed group membership for Tg from danchip to danchip and administrator
• 13:28, 23 April 2010 Jml talk contribs changed group membership for Jve from (none) to danchip
• 16:13, 25 February 2010 Jml talk contribs changed group membership for Co from (none) to nanotech
• 10:10, 25 February 2010 Jml talk contribs changed group membership for Frd from (none) to nanotech
• 10:10, 25 February 2010 Jml talk contribs changed group membership for Lic from (none) to nanotech
• 13:52, 28 January 2010 Jml talk contribs changed group membership for Krm from danchip and nanotech to danchip
• 13:51, 28 January 2010 Jml talk contribs changed group membership for Krm from nanotech to nanotech and danchip
• 16:05, 18 September 2009 Jml talk contribs uploaded File:Lor data sheet.pdf (Data sheet for LOR resist)
• 14:31, 18 September 2009 Jml talk contribs uploaded File:Processing Procedures for Dry-Etch CYCLOTENE.pdf (A description of the processing procedures for BCB)
• 13:34, 18 September 2009 Jml talk contribs deleted page \mask clean (content was: '=== Using 7-up for cleaning of masks === The cleaning bath consists of H2SO4 and should be mixed with Ammonium Persulfate for proper cleansing. Check that the back/righ...' (and the only contributor was 'Jml'))
• 13:33, 18 September 2009 Jml talk contribs deleted page Specific Process Knowledge/III-V Process/photolithography/mask clean (content was: '=== Using 7-up for cleaning of masks === The cleaning bath consists of H2SO4 and should be mixed with Ammonium Persulfate for proper cleansing. Check that the back/righ...' (and the only contributor was 'Jml'))
• 10:23, 1 July 2009 Jml talk contribs changed group membership for Khr from (none) to nanotech
• 12:16, 10 June 2009 Jml talk contribs changed group membership for Ksnilt from (none) to industry