Upload log

Below is a list of the most recent file uploads. See the gallery of new files for a more visual overview.

15:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
15:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
15:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
15:43, 15 March 2011 Jml talk contribs uploaded File:WF 2B2 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.1 recipe, Run ID 424 and 425 and 427, time 180 secs, BCl3 3, HBr 17, 2mtorr, 900/50 coil/platen, 20 degs.)
15:42, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
15:42, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
15:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
15:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
15:41, 15 March 2011 Jml talk contribs uploaded File:WF 2A4 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.0 recipe, Run ID 417 and 418 and 419, time 150 secs, BCl3 5, HBr 15, 2mtorr, 900/50 coil/platen, 20 degs.)
14:51, 7 March 2011 Choi talk contribs uploaded File:Imm.jpg (Picture of the IMM.)
14:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
14:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-120.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
14:39, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-090.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
14:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
14:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
11:16, 25 February 2011 Jml talk contribs uploaded File:Crystalbond2.jpg (Problems with crystalbond on Pegasus: A wafer bonded to a carrier has slided off during process.)
16:16, 23 February 2011 Jml talk contribs uploaded File:WF 2F-6 dec092010-30 nm.jpg (ICP metal etcher: Starting point for development of Si nano etch recipe.)
16:16, 23 February 2011 Jml talk contribs uploaded File:WF 2F-6 dec092010-120 nm.jpg (ICP metal etcher: Starting point for development of Si nano etch recipe.)
15:10, 11 February 2011 Jehan talk contribs uploaded File:Process flow template.doc (Process flow template/ Procesfølge skabelon)
11:47, 10 February 2011 Elk talk contribs uploaded File:5ml SU8 2002 in32ml cycl.PNG
11:42, 10 February 2011 Elk talk contribs uploaded File:5ml SU8 2002 in 32ml cycl.PNG (Spinning curve for diluted SU8 2002.)
10:12, 3 December 2010 BGE talk contribs uploaded File:BGE GLass etch Cr50Au400n1 pinholes 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
10:12, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 04.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
10:11, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 03.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
10:11, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 02.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
10:10, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 01.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
10:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
10:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 04.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
10:08, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 03.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
10:08, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 02.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
10:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 01.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
09:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 4.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
09:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 3.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
09:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 2.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
09:06, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 1.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
09:06, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 6.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
17:00, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 05.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
17:00, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 04.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
16:59, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 03.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
16:59, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 02.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
16:58, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 01.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
17:12, 15 November 2010 BGE talk contribs uploaded File:AOE act neg resist profile.jpg
17:04, 15 November 2010 BGE talk contribs uploaded File:AOE act neg 2 A.jpg
14:12, 27 October 2010 Tg talk contribs uploaded File:F 01.jpg (udefra aften)
14:04, 27 October 2010 Tg talk contribs uploaded File:Indefra.jpg (indefra)
13:58, 27 October 2010 Tg talk contribs uploaded File:Folder 003.jpg (renrum udefra)
13:55, 27 October 2010 Tg talk contribs uploaded File:Folder 004.jpg (e-beam)
13:15, 4 June 2010 Elk talk contribs uploaded File:SAL 601 spinning in SSE Spinner Maximus.pdf (SAL601 spinning on SSE spinner recipe suggestion.)
10:54, 20 May 2010 Pvl talk contribs uploaded File:Pegasus TPE.ppt (Pegasus results - Thomas Pedersen )
21:10, 7 May 2010 Fj talk contribs uploaded File:Pegasus AcceptanceTest.pdf (Report of DRIE-Pegasus acceptance test, April 2010)