Upload log
Below is a list of the most recent file uploads. See the gallery of new files for a more visual overview.
- 10:12, 3 December 2010 BGE talk contribs uploaded File:BGE GLass etch Cr50Au400n1 pinholes 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
- 10:12, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 04.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
- 10:11, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 03.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
- 10:11, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 02.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
- 10:10, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 01.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
- 10:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
- 10:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 04.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
- 10:08, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 03.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
- 10:08, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 02.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
- 10:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 01.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
- 09:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 4.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
- 09:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 3.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
- 09:07, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 2.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
- 09:06, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 pinholes 1.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
- 09:06, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test2 6.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering is on and has been heated to 180 degrees before etching in 40% HF for 15 min.)
- 17:00, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 05.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
- 17:00, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 04.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
- 16:59, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 03.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
- 16:59, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 02.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
- 16:58, 1 December 2010 BGE talk contribs uploaded File:BGE Glass etch Lesker test1 01.jpg (Borofloat etch with silicon mask made in the Lesker at 200dg. Resist mask from the pattering has been removed before etching in 40% HF for 15 min.)
- 17:12, 15 November 2010 BGE talk contribs uploaded File:AOE act neg resist profile.jpg
- 17:04, 15 November 2010 BGE talk contribs uploaded File:AOE act neg 2 A.jpg
- 14:12, 27 October 2010 Tg talk contribs uploaded File:F 01.jpg (udefra aften)
- 14:04, 27 October 2010 Tg talk contribs uploaded File:Indefra.jpg (indefra)
- 13:58, 27 October 2010 Tg talk contribs uploaded File:Folder 003.jpg (renrum udefra)
- 13:55, 27 October 2010 Tg talk contribs uploaded File:Folder 004.jpg (e-beam)
- 13:15, 4 June 2010 Elk talk contribs uploaded File:SAL 601 spinning in SSE Spinner Maximus.pdf (SAL601 spinning on SSE spinner recipe suggestion.)
- 10:54, 20 May 2010 Pvl talk contribs uploaded File:Pegasus TPE.ppt (Pegasus results - Thomas Pedersen )
- 21:10, 7 May 2010 Fj talk contribs uploaded File:Pegasus AcceptanceTest.pdf (Report of DRIE-Pegasus acceptance test, April 2010)
- 10:26, 12 March 2010 Roycork talk contribs uploaded File:III-V Materials ICP etcher.pdf
- 10:16, 12 March 2010 Roycork talk contribs uploaded File:SPTS ICP Metal Etcher.pdf
- 10:00, 12 March 2010 Roycork talk contribs uploaded File:SPTS Pegasus user manual.pdf
- 09:53, 12 March 2010 Roycork talk contribs uploaded File:MACS Operator's Manual V2.2.pdf (Manual for Pegasus)
- 17:25, 17 February 2010 Kn talk contribs uploaded File:SiN cantilever dried CPD nr7.jpg (For CPD page: SiN cantilever dryed in Critical Point Dryer. Picture from Tom Larsen, Nanoprobes.)
- 17:21, 17 February 2010 Kn talk contribs uploaded File:SiN cantilever dried CPD.jpg (For CPD page: SiN cantilever dried in Critcal point dryer. Picture from Tom Larsen, Nanoprobes.)
- 17:06, 17 February 2010 Kn talk contribs uploaded File:SiN dried air.jpg (For CPD page: SiN cantilever dryed in air. Picture from Tom Larsen, Nanoprobes.)
- 16:50, 17 February 2010 Kn talk contribs uploaded File:SiN cantilever dryed air.ppt (For CPD page: SiN cantilever dryed in air. Picture from Tom Larsen, Nanoprobes.)
- 15:25, 17 February 2010 Kn talk contribs uploaded File:CPD.JPG (Picture of the Critical Point Dryer.)
- 11:09, 22 December 2009 Elk talk contribs uploaded File:Nonconfirmity Support note 0001.pdf
- 11:02, 22 December 2009 Elk talk contribs uploaded File:Nonconformity support note 0001.pdf (Defect free spinning of MR-i7030 resist with SSE Spinner Maximus.)
- 09:30, 22 December 2009 Elk talk contribs uploaded File:KS Spinner extract box.png (Extract box for SU8/unbaked wafers.)
- 13:06, 30 November 2009 Roycork talk contribs uploaded File:Pegasus System Description & Differentiation.pdf (The advantages the pegasus has over our existing etchers)
- 13:03, 30 November 2009 Roycork talk contribs uploaded File:Pegasus specification v2.4.pdf (Detailed hardware info pegasus)
- 12:49, 30 November 2009 Roycork talk contribs uploaded File:Appl-sheets-4 markets.pdf (Pegasus process doc)
- 12:47, 30 November 2009 Roycork talk contribs uploaded File:Packaging-etch.pdf (Pegasus process doc)
- 12:46, 30 November 2009 Roycork talk contribs uploaded File:Nanotechnology.pdf (Pegasus process doc)
- 12:45, 30 November 2009 Roycork talk contribs uploaded File:Energy.pdf (Pegasus process doc)
- 12:44, 30 November 2009 Roycork talk contribs uploaded File:Bio-medical.pdf (Pegasus process doc)
- 12:39, 30 November 2009 Roycork talk contribs uploaded File:Macs v2.pdf (Robot handling system for the pegasus)
- 12:32, 30 November 2009 Roycork talk contribs uploaded File:Aerospace.pdf (Process info Pegasus)
