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Showing below up to 50 results in range #101 to #150.

101. Specific Process Knowledge/Thin film deposition/Deposition of Aluminium/Al Sputtering in Cluster Lesker PC3 (09:52, 30 January 2025)
102. Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617 (01:00, 8 February 2025)
103. Specific Process Knowledge/Doping (15:47, 12 February 2025)
104. Specific Process Knowledge/Wafer and sample drying (15:48, 12 February 2025)
105. Specific Process Knowledge/Bonding (18:05, 13 February 2025)
106. Surveys and statistics (19:21, 13 February 2025)
107. Specific Process Knowledge/Pattern Design/Travka (19:24, 13 February 2025)
108. Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium (12:39, 18 February 2025)
109. LabAdviser/Courses/TPT Thin Film (20:54, 24 February 2025)
110. LabAdviser/Courses/TPT Dry Etch (00:03, 25 February 2025)
111. Deposition of SiN with PECVD4/NEW TESTS QC (15:14, 4 March 2025)
112. Specific Process Knowledge/Thermal Process/Storage and cleaning of wafer to the A, B, C and E stack furnaces (14:22, 6 March 2025)
113. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of silicon nitride using Lesker sputter system (15:00, 6 March 2025)
114. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of silicon nitride using Sputter-System Metal-Oxide(PC1) (15:01, 6 March 2025)
115. Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si and a-Si (15:24, 6 March 2025)
116. Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride/Deposition of low stress nitride using the 4" LPCVD nitride furnace (16:12, 6 March 2025)
117. Specific Process Knowledge/Thermal Process/Resist Pyrolysis furnace/Pyrolysis with Resist Pyrlysis furnace (16:14, 6 March 2025)
118. Specific Process Knowledge/Etch/III-V ICP/InP-InGaAsP-InGaAs (08:51, 10 March 2025)
119. Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point (09:06, 10 March 2025)
120. Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/SiO2 etch with resist mask (09:20, 10 March 2025)
121. LabAdviser/Technology Research/Nanofabrication of Inductive Components for Integrated Power Supply On Chip/3D Passive Interposer (09:36, 10 March 2025)
122. Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New (12:49, 10 March 2025)
123. Specific Process Knowledge/Thin film deposition/TiO2 deposition using Sputter-System Metal-Oxide(PC1) (11:55, 12 March 2025)
124. Specific Process Knowledge/Lithography/Coaters/GammaDUV (15:46, 17 March 2025)
125. Specific Process Knowledge/Etch/Etching of Silicon Nitride (09:46, 26 March 2025)
126. Specific Process Knowledge/Etch/Lithium niobate (15:03, 28 March 2025)
127. Specific Process Knowledge/Etch/Etching of Titanium (15:43, 28 March 2025)
128. Specific Process Knowledge/Etch/Etching of Molybdenum (15:43, 28 March 2025)
129. Specific Process Knowledge/Etch/Etching of Gold (15:43, 28 March 2025)
130. Specific Process Knowledge/Etch/Etching of Platinum (15:44, 28 March 2025)
131. Specific Process Knowledge/Etch/Aluminum Oxide (15:45, 28 March 2025)
132. Specific Process Knowledge/Etch/Etching of Silicon Oxide (15:45, 28 March 2025)
133. Specific Process Knowledge/Etch/Etching of SU-8 (13:32, 31 March 2025)
134. Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Silicon Nitride Etch using AOE (13:35, 31 March 2025)
135. Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/Cr etch data from AS (13:37, 31 March 2025)
136. Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD/MF SiN results (13:39, 31 March 2025)
137. Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2/Images of 1SIO2mbr with burned resist mask (13:44, 31 March 2025)
138. Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch with III-V ICP (13:45, 31 March 2025)
139. Specific Process Knowledge/Etch/Etching of Polymer/Polymer Etch by ASE (13:48, 31 March 2025)
140. Specific Process Knowledge/Etch/III-V ICP/GaN (13:53, 31 March 2025)
141. Specific Process Knowledge/Etch/III-V ICP/GaAsnano (13:54, 31 March 2025)
142. Specific Process Knowledge/Characterization/Optical characterization/advanced ellipsometry (13:55, 31 March 2025)
143. Specific Process Knowledge/Characterization/XRD/dataconversion (15:17, 31 March 2025)
144. Specific Process Knowledge/Wafer cleaning/Cleaning with Soap Sonic (09:20, 1 April 2025)
145. Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch using HF (12:37, 3 April 2025)
146. Specific Process Knowledge/Characterization/XPS/REELS (08:27, 4 April 2025)
147. Specific Process Knowledge/DRIE-Pegasus/Pegasus-2/OldConfig (08:27, 4 April 2025)
148. Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic/Isoslow7 (08:27, 4 April 2025)
149. Specific Process Knowledge/Characterization/XPS/Processing/ALDSandwich1/2Survey (08:28, 4 April 2025)
150. Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-3/DREM/DREM 0.5kW v2.3 (08:32, 4 April 2025)