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22:32, 16 June 2025 Mmat talk contribs deleted page Template:NanolabInfo (outdated, info moved)
22:32, 16 June 2025 Mmat talk contribs deleted page Template:Maximus: AZ5214E (outdated, no relevant content)
22:31, 16 June 2025 Mmat talk contribs deleted page Template:Mask spec (not used)
22:31, 16 June 2025 Mmat talk contribs deleted page Template:Jjsbhfh (not used)
22:31, 16 June 2025 Mmat talk contribs deleted page Template:DanchipInfo (outdated, text moved direclty into respective page)
22:31, 16 June 2025 Mmat talk contribs deleted page Template:Cc-vthongu1 (text moved directly into the page)
22:30, 16 June 2025 Mmat talk contribs deleted page Template:Cc-jehem1 (not used)
22:30, 16 June 2025 Mmat talk contribs deleted page Template:CC1 (doublé)
22:30, 16 June 2025 Mmat talk contribs deleted page Template:CC-bghe-created (doublé)
22:30, 16 June 2025 Mmat talk contribs deleted page Template:CC-DTU (no content)
17:39, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/Process (content moved)
17:38, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/Nozzle (content moved)
17:38, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/Robot (content moved)
17:38, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/Eject (content moved)
17:38, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/Demolding (content moved)
17:37, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/Dosing (content was: "to be deleted", and the only contributor was "Choi" (talk))
17:33, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/Cooling (content moved)
17:33, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/AfterPressure (content moved)
17:33, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/SwitchOver (content moved)
17:33, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/Injection (content moved)
17:33, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/MoldClose (content moved)
17:32, 16 June 2025 Mmat talk contribs deleted page Specific Process Knowledge/Back-end processing/Polymer Injection Molder/MoldTemp (content moved)
17:14, 16 June 2025 Mmat talk contribs deleted page Category:Equipment/Characterization (no content (content before blanking was: "gujhguhg"))
17:11, 16 June 2025 Mmat talk contribs deleted page Category:Thin Film Depostion (no content)
17:08, 16 June 2025 Mmat talk contribs created page Category:Backend (Created blank page)
17:02, 16 June 2025 Mmat talk contribs created page Category:Resist (Created blank page) Tag: Visual edit: Switched
17:01, 16 June 2025 Mmat talk contribs created page Category:314-Preparation (Created page with "This category includes all pages related to Preparation for Electron Beam Microscopy at DTU Nanolab building 314/307..") Tag: Visual edit
16:27, 12 June 2025 Mmat talk contribs created page File:Rawta.png
16:27, 12 June 2025 Mmat talk contribs uploaded File:Rawta.png
08:22, 12 June 2025 User account S214442 talk contribs was created automatically
08:19, 12 June 2025 User account S203864 talk contribs was created automatically
08:19, 12 June 2025 User account Mamani talk contribs was created automatically
08:18, 12 June 2025 User account S214458 talk contribs was created automatically
12:59, 11 June 2025 User account Evavogt talk contribs was created automatically
09:43, 11 June 2025 Bghe talk contribs changed group membership for Mmat from NLAB-Employees-701 and NLAB-LabmanagerAllUsers to NLAB-Employees-701, NLAB-LabmanagerAllUsers and administrator
09:38, 11 June 2025 User account Mosha talk contribs was created automatically
19:22, 8 June 2025 User account Tegru talk contribs was created automatically
13:12, 5 June 2025 User account S234424 talk contribs was created automatically
21:26, 4 June 2025 User account S234460 talk contribs was created automatically
13:21, 4 June 2025 User account Mokmap talk contribs was created automatically
23:08, 2 June 2025 User account Leimo talk contribs was created automatically
20:40, 27 May 2025 Mmat talk contribs created page Specific Process Knowledge/Characterization/Dektak 150 (Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Dektak_150 click here]''' Characterization Profiler Profiler == Stylus Profiler: Dektak150 == image:Dektak150.JPG|300x300px|right|thumb|Stylus profiler:Dektak150, currently located in building 451, room...")
20:37, 27 May 2025 Mmat talk contribs created page Specific Process Knowledge/Characterization/Dektak 3ST (Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Dektak_3ST click here]''' Characterization Profiler Profiler == Dektak 3ST == 300x300px|right|thumb|The profiler placed in 346-904 (Dektak 3ST). The Dektak 3ST is intended for...")
20:34, 27 May 2025 Mmat talk contribs created page Specific Process Knowledge/Characterization/Filmetrics (Created page with "==Optical Profiler (Filmetrics)== {{CC-bghe2}} 275x275px|right|thumb|Optical Profiler (Filmetrics): positioned in the basement (346-904), {{photo1}} The Profilm3D optical profiler from Filmetrics uses white-light-interferometry (WLI) and phase-shifting-interferometry (PSI) to produce surface profiles and depth-of-field color images. The main purpose is 3D topographic imaging of surfaces, step height measurements and roughnes...")
20:29, 27 May 2025 Mmat talk contribs created page Specific Process Knowledge/Characterization/Sensofar S Neox (Created page with "{{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Sensofar S Neox click here]''' Characterization Profiler Profiler ==Optical Profiler (Sensofar S Neox) == {{CC-bghe2}} image:IMG_4555.JPG|275x275px|right|thumb|Optical Profiler (Sensofar): positioned in the clea...")
20:08, 27 May 2025 Mmat talk contribs created page Specific Process Knowledge/Characterization/Tencor P17 (Created page with "==Tencor P17 Stylus Profiler== The P17 Stylus Profiler from KLA Tencor is used in a similar manner to the Dektak XTA for profiling surfaces with structures in the micro- and submicrometer range as well as for measuring stress. Compared to the DektakXT, the P17 has more advanced options for stress measurements: It allows the user to measure a stress map with up to 5° radial resolution. Programming and...")
19:49, 27 May 2025 Mmat talk contribs created page Specific Process Knowledge/Characterization/Dektak XTA (Created page with "==Dektak XTA stylus profiler== The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions. A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to...")
18:24, 27 May 2025 Mmat talk contribs created page Specific Process Knowledge/Pattern Design/Mask Specifications (Created page with "Below you can find two examples on how to write the specification for 5" and 7" masks. 5" masks All Layers: 5" chromium mask fracture limits ((-50000, -50000),(50000, 50000)) Dark periphery Chromium down GDS-file: GLO006_v7.gds Top cell: wafer Layer (GDS number): 01 Mask Type: Digitised data= Dark, right reading Text(max 30 characters): init-2019-Nitride-etch Layer (GDS number): 02 Mask Type: Digitised data= Clear, Wrong reading Text(max 30 characters): init-2...")
17:42, 27 May 2025 Mmat talk contribs created page LabAdviser/Process Flow/Solar cell process flow (Created page with "'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://http://labadviser.danchip.dtu.dk/index.php/Solar_cell_process_flow click here]''' ==Introduction== 275x275px|left|thumb|Figure 1. A wafer with an array of solar cells.|alt=A wafer with an array of solar cellsA solar cell (photovoltaic cell) converts light energy into electricity. When shining light on to the solar cell, photons will be a...")
14:01, 27 May 2025 Pevo talk contribs created page Specific Process Knowledge/Thermal Process/C2 Furnace General Purpose Annealing (Created page with "'''Feedback to this page''': '''[mailto:thinfilm@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thermal_Process/C2_Furnace_III-V_oxidation click here]''' ''This page is written by DTU Nanolab internal'' ==General Purpose Annealing furnace (C2) == The General Purpose Annealing furnace (C2) is a Tempress horizontal furnace located in the furnace C stack. The furnace has from September 2024 become...")