Main public logs
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- 22:44, 13 January 2025 Mmat talk contribs created page File:Solar Cell process flow 2024.docx (File uploaded with MsUpload)
- 22:44, 13 January 2025 Mmat talk contribs uploaded File:Solar Cell process flow 2024.docx (File uploaded with MsUpload)
- 22:42, 13 January 2025 Mmat talk contribs created page File:Solar Cells - process flow 2024.pdf (File uploaded with MsUpload)
- 22:42, 13 January 2025 Mmat talk contribs uploaded File:Solar Cells - process flow 2024.pdf (File uploaded with MsUpload)
- 22:41, 13 January 2025 Mmat talk contribs created page File:Solar Cells - process flow 2024.docx (File uploaded with MsUpload)
- 22:41, 13 January 2025 Mmat talk contribs uploaded File:Solar Cells - process flow 2024.docx (File uploaded with MsUpload)
- 22:39, 13 January 2025 Mmat talk contribs uploaded a new version of File:Green Belt Process May 2016.docx
- 00:15, 13 January 2025 User account Mheu talk contribs was created automatically
- 16:14, 12 January 2025 User account Saikm talk contribs was created automatically
- 17:05, 10 January 2025 Jehem talk contribs created page File:PA temperature v1.png
- 17:05, 10 January 2025 Jehem talk contribs uploaded File:PA temperature v1.png
- 17:05, 10 January 2025 Jehem talk contribs created page File:PA gas mix v2.png
- 17:05, 10 January 2025 Jehem talk contribs uploaded File:PA gas mix v2.png
- 17:05, 10 January 2025 Jehem talk contribs created page File:PA flowRate v2.png
- 17:05, 10 January 2025 Jehem talk contribs uploaded File:PA flowRate v2.png
- 17:04, 10 January 2025 Jehem talk contribs created page File:PA chamber pressure v2.png
- 17:04, 10 January 2025 Jehem talk contribs uploaded File:PA chamber pressure v2.png
- 16:39, 10 January 2025 User account Marhac talk contribs was created automatically
- 14:28, 10 January 2025 User account S215229 talk contribs was created automatically
- 11:03, 10 January 2025 User account Davbe talk contribs was created automatically
- 10:58, 10 January 2025 Taran talk contribs created page File:AlignmentMark KOH.gds
- 10:58, 10 January 2025 Taran talk contribs uploaded File:AlignmentMark KOH.gds
- 10:57, 10 January 2025 Taran talk contribs created page File:MLA alignmentMarks arrows.gds
- 10:57, 10 January 2025 Taran talk contribs uploaded File:MLA alignmentMarks arrows.gds
- 10:55, 10 January 2025 Taran talk contribs created page File:MLA AlignmentMarks simple.gds
- 10:55, 10 January 2025 Taran talk contribs uploaded File:MLA AlignmentMarks simple.gds
- 10:50, 10 January 2025 Taran talk contribs created page File:Gamma coater & developer chucks + hotplate pins.gds
- 10:50, 10 January 2025 Taran talk contribs uploaded File:Gamma coater & developer chucks + hotplate pins.gds
- 09:49, 10 January 2025 Jehem talk contribs created page File:PA flowRate v1.png
- 09:49, 10 January 2025 Jehem talk contribs uploaded File:PA flowRate v1.png
- 09:43, 10 January 2025 Jehem talk contribs created page File:PA chamber pressure v1.png
- 09:43, 10 January 2025 Jehem talk contribs uploaded File:PA chamber pressure v1.png
- 09:40, 10 January 2025 Jehem talk contribs created page File:PA gas mix v1.png
- 09:40, 10 January 2025 Jehem talk contribs uploaded File:PA gas mix v1.png
- 17:12, 9 January 2025 Jehem talk contribs created page Specific Process Knowledge/Lithography/Strip/PlasmaAsher2 (Created page with "300x300px|thumb|Plasma asher for removing AZ resist on 6" wafers: positioned in E-5 The Plasma Asher 2 is the same as Plasma Asher 1 but has another loading system which is more convenient for batch loading of 6inch substrates. In this machine, only O2 and N2 gases are used for processes (in PlasmaAsher1, CF4 is used as well). The typical process parameters when operating the equipment: *Photeresist stripping Pressure: 0.8 - 1.0 mbar...")
- 17:11, 9 January 2025 Jehem talk contribs created page Specific Process Knowledge/Lithography/Strip/PlasmaAsher1 (Created page with "300x300px|thumb|The Plasma Asher 1 is placed in C-1 The Plasma Asher 1 (TePla 300 auto load model) can be used for the following process: *Photoresist stripping *Descumming *Surface cleaning after storage *Surface cleaning after processes using oil pump or diffusion pump vacuum *Surface cleaning as part of photolithography after wet developing of lacquer structures prior to wet or plasma etching *Stripping of photoresist layers after etching,...")
- 10:14, 8 January 2025 Jenk talk contribs uploaded a new version of File:Warning Computer Machine.png
- 10:12, 8 January 2025 Jenk talk contribs uploaded a new version of File:Warning Computer Machine.png
- 10:04, 8 January 2025 Jenk talk contribs created page File:Warning Computer Machine.png
- 10:04, 8 January 2025 Jenk talk contribs uploaded File:Warning Computer Machine.png
- 11:49, 7 January 2025 User account S194115 talk contribs was created automatically
- 09:26, 7 January 2025 User account S223006 talk contribs was created automatically
- 09:25, 7 January 2025 User account S232157 talk contribs was created automatically
- 09:24, 7 January 2025 User account S183746 talk contribs was created automatically
- 09:24, 7 January 2025 User account S203891 talk contribs was created automatically
- 09:22, 7 January 2025 User account S214496 talk contribs was created automatically
- 18:50, 6 January 2025 User account S204439 talk contribs was created automatically
- 17:52, 6 January 2025 User account S224457 talk contribs was created automatically
- 15:07, 3 January 2025 Thope talk contribs created page Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 (Created page with "Under construction") Tag: Visual edit
- 19:33, 18 December 2024 User account S214454 talk contribs was created automatically
