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16:50, 13 February 2023 Mbec talk contribs created page Oxide growth using HNO3 (Created page with "hej")
11:38, 13 February 2023 User account S202941 talk contribs was created automatically
10:06, 13 February 2023 Indiogo talk contribs created page File:Report Updated.pdf (File uploaded with MsUpload)
10:06, 13 February 2023 Indiogo talk contribs uploaded File:Report Updated.pdf (File uploaded with MsUpload)
16:45, 11 February 2023 User account S212978 talk contribs was created automatically
15:29, 10 February 2023 User account S183820 talk contribs was created automatically
01:16, 9 February 2023 User account Sammar talk contribs was created automatically
17:02, 7 February 2023 User account Mavos talk contribs was created automatically
13:39, 7 February 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Pretreatment/Oven 250C (Created page with "=Oven 250C= 300x300px|thumb|Oven 250C for pretreatment in Cx-1 The oven is typically used for dehydration pretreatment, of Si and glass substrates, to promote the resist adhesion. We recommend placing the wafers in a metal carrier in the oven for at least for 4 hours, or overnight, and spin coat resist on them as soon as possible after removing them from the oven. The user manual, and contact information can be found...")
09:54, 7 February 2023 User account Amasta talk contribs was created automatically
17:27, 6 February 2023 User account Lyyu talk contribs was created automatically
17:16, 6 February 2023 Bghe talk contribs deleted page Specific Process Knowledge/Back-end processing/Wafer Scriber (Rune: system no longer in the cleanroom)
15:20, 6 February 2023 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2/Images of 1SiO2mSi with p-Si mask (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Silicon_Oxide/SiO2_etch_using_RIE1_or_RIE2/Images_of_1SiO2mSi_with_p-Si_mask click here]''' =<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned </span> = ==This work was done on RIE1 which has been decommissioned but we expect the result...")
15:12, 6 February 2023 Eves talk contribs created page File:Eves BB slit selection 20230206.png (File uploaded with MsUpload)
15:12, 6 February 2023 Eves talk contribs uploaded File:Eves BB slit selection 20230206.png (File uploaded with MsUpload)
15:12, 6 February 2023 Eves talk contribs created page File:Eves PB slit selection 20230206.png (File uploaded with MsUpload)
15:12, 6 February 2023 Eves talk contribs uploaded File:Eves PB slit selection 20230206.png (File uploaded with MsUpload)
15:12, 6 February 2023 Eves talk contribs created page File:Eves Bragg Brentano concept 20230206.png (File uploaded with MsUpload)
15:12, 6 February 2023 Eves talk contribs uploaded File:Eves Bragg Brentano concept 20230206.png (File uploaded with MsUpload)
14:51, 6 February 2023 Bghe talk contribs created page Template:Feedback link (Created page with "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/{{{Page_name}}} click here]'''")
12:21, 6 February 2023 Eves talk contribs uploaded a new version of File:Eves XRD drawing series HRXRD2 20230206.png (File uploaded with MsUpload)
12:13, 6 February 2023 Eves talk contribs created page File:Eves XRD drawing series XRR1 20230206.png (File uploaded with MsUpload)
12:13, 6 February 2023 Eves talk contribs uploaded File:Eves XRD drawing series XRR1 20230206.png (File uploaded with MsUpload)
12:13, 6 February 2023 Eves talk contribs created page File:Eves XRD drawing series XRR2 20230206.png (File uploaded with MsUpload)
12:13, 6 February 2023 Eves talk contribs uploaded File:Eves XRD drawing series XRR2 20230206.png (File uploaded with MsUpload)
12:12, 6 February 2023 Eves talk contribs created page File:Eves XRD drawing series HRXRD1 20230206.png (File uploaded with MsUpload)
12:12, 6 February 2023 Eves talk contribs uploaded File:Eves XRD drawing series HRXRD1 20230206.png (File uploaded with MsUpload)
12:12, 6 February 2023 Eves talk contribs created page File:Eves XRD drawing series HRXRD2 20230206.png (File uploaded with MsUpload)
12:12, 6 February 2023 Eves talk contribs uploaded File:Eves XRD drawing series HRXRD2 20230206.png (File uploaded with MsUpload)
12:08, 6 February 2023 Eves talk contribs created page File:Eves XRD drawing series RC1 20230206.png (File uploaded with MsUpload)
12:08, 6 February 2023 Eves talk contribs uploaded File:Eves XRD drawing series RC1 20230206.png (File uploaded with MsUpload)
12:08, 6 February 2023 Eves talk contribs created page File:Eves XRD drawing series RC2 20230206.png (File uploaded with MsUpload)
12:08, 6 February 2023 Eves talk contribs uploaded File:Eves XRD drawing series RC2 20230206.png (File uploaded with MsUpload)
11:44, 6 February 2023 Eves talk contribs created page File:Eves XRD drawing series GiXRD 20230206.png (File uploaded with MsUpload)
11:44, 6 February 2023 Eves talk contribs uploaded File:Eves XRD drawing series GiXRD 20230206.png (File uploaded with MsUpload)
11:39, 6 February 2023 Eves talk contribs created page File:Eves XRD drawing series T2T 20230206.png (File uploaded with MsUpload)
11:39, 6 February 2023 Eves talk contribs uploaded File:Eves XRD drawing series T2T 20230206.png (File uploaded with MsUpload)
16:51, 3 February 2023 Eves talk contribs created page File:Eves XRR concept 20230203.png (File uploaded with MsUpload)
16:51, 3 February 2023 Eves talk contribs uploaded File:Eves XRR concept 20230203.png (File uploaded with MsUpload)
14:46, 3 February 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/Resist/UserBottles (Created page with "== User resist bottles in the cleanroom == 150px|right We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the guidelines below. * Find a blue-capped glass bottle in the cupboard next to office 055 in 346 (outside the cleanroom). * Bring the bottle inside gowning; clean it thoroughly '''on the outside''' with water or alcohol * Bring the bottle to a fumehood inside the cleanroom; clean the...")
14:44, 3 February 2023 Indiogo talk contribs created page File:LL&station Annealsys.png
14:44, 3 February 2023 Indiogo talk contribs uploaded File:LL&station Annealsys.png
13:32, 3 February 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography/DUVStepperLithography/DUVStepper (Created page with "==DUV Stepper== 300x300px|right|thumb|DUV Stepper is placed in F-3 '''Feedback to this section''': '''[mailto:labadviser@anolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/DUVStepperLithography#DUV_Stepper_FPA-3000EX4_from_Canon click here]''' The deep-UV stepper FPA-3000EX4 from Canon is an advanced exposure system designed for mass-production of 6 and...")
13:31, 3 February 2023 Jehem talk contribs created page Specific Process Knowledge/Lithography//DUVStepperLithography/DUVStepper (Created page with "==DUV Stepper== 300x300px|right|thumb|DUV Stepper is placed in F-3 '''Feedback to this section''': '''[mailto:labadviser@anolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/DUVStepperLithography#DUV_Stepper_FPA-3000EX4_from_Canon click here]''' The deep-UV stepper FPA-3000EX4 from Canon is an advanced exposure system designed for mass-production of 6 and...")
13:26, 3 February 2023 Jehem talk contribs created page File:HMDS priming schematic.png
13:26, 3 February 2023 Jehem talk contribs uploaded File:HMDS priming schematic.png
13:20, 3 February 2023 Jehem talk contribs uploaded a new version of File:Hmds new.jpg
13:05, 3 February 2023 User account S173982 talk contribs was created automatically
12:25, 3 February 2023 Bghe talk contribs deleted page Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiN Etch (content was: "==Stripping SRN from the whole wafer surface== This recipe has not been optimized for Silicon Rich Nitride but can be used for stripping one wafer side for the nitride when an over etch in the underlaying layer is not a problem.", and the only contributor was "Bghe" (talk))
11:46, 3 February 2023 Bghe talk contribs created page Template:CC-bghe-created (Created page with "'''''Unless otherwise stated, all content on this page was created by Berit Herstrøm, DTU Nanolab'''''")