Main public logs

Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).

14:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
14:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)
11:21, 25 February 2011 Ast talk contribs changed group membership for Wan from (none) to nanotech
11:16, 25 February 2011 Jml talk contribs uploaded File:Crystalbond2.jpg (Problems with crystalbond on Pegasus: A wafer bonded to a carrier has slided off during process.)
13:02, 24 February 2011 Ast talk contribs changed group membership for Zhe from (none) to nanotech
12:33, 24 February 2011 Ast talk contribs changed group membership for Remn from (none) to nanotech
11:05, 24 February 2011 Ast talk contribs changed group membership for Makei from (none) to danchip
16:16, 23 February 2011 Jml talk contribs uploaded File:WF 2F-6 dec092010-30 nm.jpg (ICP metal etcher: Starting point for development of Si nano etch recipe.)
16:16, 23 February 2011 Jml talk contribs uploaded File:WF 2F-6 dec092010-120 nm.jpg (ICP metal etcher: Starting point for development of Si nano etch recipe.)
14:17, 23 February 2011 Ast talk contribs changed group membership for Joer from (none) to nanotech
11:51, 22 February 2011 Ast talk contribs changed group membership for Ales from (none) to nanotech
12:53, 21 February 2011 Ast talk contribs changed group membership for Cdp from (none) to nanotech
10:08, 16 February 2011 Ast talk contribs changed group membership for Imso from (none) to fotonik
15:10, 11 February 2011 Jehan talk contribs uploaded File:Process flow template.doc (Process flow template/ Procesfølge skabelon)
12:31, 10 February 2011 Ast talk contribs changed group membership for Ekm from (none) to nanotech
12:25, 10 February 2011 Ast talk contribs changed group membership for Suh from (none) to nanotech
11:47, 10 February 2011 Elk talk contribs uploaded File:5ml SU8 2002 in32ml cycl.PNG
11:42, 10 February 2011 Elk talk contribs uploaded File:5ml SU8 2002 in 32ml cycl.PNG (Spinning curve for diluted SU8 2002.)
11:54, 9 February 2011 Ast talk contribs changed group membership for Giogi from (none) to fotonik
11:32, 9 February 2011 Ast talk contribs changed group membership for Greal from (none) to industry
11:24, 9 February 2011 Ast talk contribs changed group membership for Mahuf from (none) to industry
12:19, 8 February 2011 Ast talk contribs changed group membership for Zolba from (none) to industry
11:23, 8 February 2011 Ast talk contribs changed group membership for Paom from (none) to nanotech
11:02, 8 February 2011 Ast talk contribs changed group membership for Afp from (none) to nanotech
15:50, 1 February 2011 Ast talk contribs changed group membership for Gllk from (none) to nanotech
16:05, 31 January 2011 Ast talk contribs changed group membership for Choi from (none) to danchip
11:44, 31 January 2011 Ast talk contribs changed group membership for Ssg from (none) to fotonik
11:11, 24 January 2011 Ast talk contribs changed group membership for Clgr from (none) to fotonik
10:16, 19 January 2011 Ast talk contribs changed group membership for Lkt from (none) to nanotech
11:25, 17 January 2011 Ast talk contribs changed group membership for Zhalu from (none) to nanotech
10:58, 17 January 2011 Ast talk contribs changed group membership for Lmb from (none) to nanotech
10:48, 17 January 2011 Ast talk contribs changed group membership for Jdt from (none) to nanotech
10:46, 17 January 2011 Ast talk contribs changed group membership for Saen from (none) to nanotech
10:41, 17 January 2011 Ast talk contribs changed group membership for Cb from (none) to danchip
10:34, 17 January 2011 Ast talk contribs changed group membership for Gs from (none) to danchip
15:42, 12 January 2011 Meno talk contribs changed group membership for CMP from (none) to nanotech
15:24, 6 January 2011 Meno talk contribs changed group membership for KE from (none) to nanotech
12:38, 4 January 2011 Ast talk contribs changed group membership for Jvl from (none) to nanotech
10:18, 21 December 2010 Ast talk contribs changed group membership for Izzet from (none) to nanotech
11:41, 9 December 2010 Ast talk contribs changed group membership for Jehan from industry to danchip
10:49, 9 December 2010 Ast talk contribs changed group membership for Lucap from (none) to nanotech
10:12, 3 December 2010 BGE talk contribs uploaded File:BGE GLass etch Cr50Au400n1 pinholes 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
10:12, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 04.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
10:11, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 03.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
10:11, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 02.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
10:10, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 pinholes 01.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken where I found some pinholes.)
10:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 05.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
10:09, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 04.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
10:08, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 03.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)
10:08, 3 December 2010 BGE talk contribs uploaded File:BGE Glass etch Cr50Au400n1 02.jpg (15min HF 40% etch of borofloat with 50/400 nm Cr/Au mask made in the Alcatel E-beam evaporator. Resist for masking the Cr/Au etch has been left on and baked at 120 degrees of ½ hour. The image is taken a random place on the wafer.)