Main public logs
Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).
- 12:34, 14 January 2009 Jml talk contribs changed group membership for Mid from (none) to nanotech
- 12:34, 14 January 2009 Jml talk contribs changed group membership for Lag from (none) to industry
- 14:30, 18 December 2008 Ho talk contribs uploaded File:-2A Nov242008 dose240 SquaresDots300nm 005 reduc.jpg
- 14:06, 18 December 2008 Ho talk contribs uploaded File:-2A Nov242008 dose240 SquaresDots300nm 003 reduc.jpg
- 12:52, 18 December 2008 Ho talk contribs uploaded File:-2A Nov242008 dose240 SquaresDots300nm 001.jpg (Dots and squares (Ti:1nm/Pt:10nm) made by lift-off process on silicon wafer.)
- 17:09, 16 December 2008 Kn talk contribs uploaded File:Au word rate5 .jpg (AFM picture of Au surface deposited in Wordentec. Dep. rate 5 Å/s. Size 2.5x2.5 my, the surface is uniform. )
- 16:34, 16 December 2008 Kn talk contribs uploaded File:AFMpict Cu Alc rate10.jpg (AFM picture of a Cu layer deposited in Alcatel. Dep. rate 10 Å/s.)
- 16:32, 16 December 2008 Kn talk contribs uploaded File:AFMpict Cu Alc 10Å S.jpg (AFM picture of a Cu layer deposited in Alcatel. Dep. rate 10 Å/s.)
- 16:29, 15 December 2008 Ho talk contribs uploaded File:Test.JPG
- 16:06, 15 December 2008 Ho talk contribs uploaded File:-2A Nov242008 dose240 SquaresDots300nm 001.TIF
- 17:14, 4 December 2008 Jml talk contribs changed group membership for Tmh from (none) to nanotech
- 09:18, 2 December 2008 BGE talk contribs uploaded File:WF 2D n6 sep19 05 1x overview.jpg (BGE ASE nano)
- 09:17, 2 December 2008 BGE talk contribs uploaded File:WF 2D n6 sep19 05 1x 100 75.jpg (BGE ASE nano)
- 09:16, 2 December 2008 BGE talk contribs uploaded File:WF 2C n5 nov3 06 overview.jpg (BGE ASE nano)
- 09:14, 2 December 2008 BGE talk contribs uploaded File:WF 2C n5 nov3 06 1x 100 75.jpg (BGE ASE nano)
- 09:13, 2 December 2008 BGE talk contribs uploaded File:WF 2A n5 jan02 06 3x overview.jpg (BGE ASE nano)
- 09:13, 2 December 2008 BGE talk contribs uploaded File:WF 2A n5 jan02 06 1x 100 75.jpg (BGE ASE nano)
- 11:16, 27 November 2008 Jml talk contribs changed group membership for Jmltest from (none) to nanotech
- 11:16, 27 November 2008 Jml talk contribs changed group membership for Jmltest from bot to (none)
- 11:07, 24 November 2008 BGE talk contribs uploaded File:RIE1 SIO2 DOE1 Selectivity 75.jpg (DOE1 SIO2 on RIE1 by BGE. Done in 2006-2007. Written in 2008. CHF3%=75)
- 11:06, 24 November 2008 BGE talk contribs uploaded a new version of File:DOE1 SIO2 RIE1 Selectivitet 70.jpg (DOE1 SIO2 on RIE1 by BGE. Done in 2007-2007. Written in 2008. CHF3%=70)
- 11:04, 24 November 2008 BGE talk contribs uploaded File:DOE1 SIO2 RIE1 Selectivitet 70.jpg
- 11:04, 24 November 2008 BGE talk contribs uploaded File:RIE1 SIO2 DOE1 Selectivitet 65.jpg (DOE1 SIO2 on RIE1 by BGE. Done in 2006-2007. Written in 2008. CHF3% = 65)
- 11:01, 24 November 2008 BGE talk contribs uploaded File:RIE1 SIO2 DOE1 Etch rate.jpg (DOE1 SIO2 on RIE1 done by BGE in 2006-2007. Written in 2008)
- 13:45, 21 November 2008 Jml talk contribs changed group membership for Cdd from (none) to nanotech
- 13:44, 21 November 2008 Jml talk contribs changed group membership for Rhp from (none) to nanotech
- 13:44, 21 November 2008 Jml talk contribs changed group membership for Rxu from (none) to nanotech
- 13:44, 21 November 2008 Jml talk contribs changed group membership for Sdu from (none) to nanotech
- 13:44, 21 November 2008 Jml talk contribs changed group membership for Th from (none) to nanotech
- 13:44, 21 November 2008 Jml talk contribs changed group membership for Tpe from (none) to nanotech
- 13:44, 21 November 2008 Jml talk contribs changed group membership for Krm from (none) to nanotech
- 14:32, 20 November 2008 BGE talk contribs changed group membership for Pxshi from (none) to danchip
- 11:10, 13 November 2008 Jml talk contribs uploaded File:2F-5 oct252008 G31.jpg (SEM FEI image of holes in 50 nm Al layer on top of a 2" quartz wafer.)
- 15:12, 20 October 2008 Jml talk contribs blocked Jmltest2 talk contribs with an expiration time of indefinite (account creation disabled, email disabled) (Testing)
- 14:09, 26 September 2008 Jml talk contribs changed group membership for Jmltest from (none) to bot
- 18:48, 25 September 2008 Jml talk contribs unblocked Jmltest talk contribs (Only a test)
- 09:15, 9 September 2008 Jml talk contribs blocked Jmltest talk contribs with an expiration time of indefinite (account creation disabled)
- 14:52, 8 September 2008 Kn talk contribs uploaded File:W 21 thermal al.jpg (AFM picture of Al deposited with thermal deposition in Wordentec.)
- 09:18, 8 September 2008 Kn talk contribs uploaded File:Tiw 150W 0 001 nr2.jpg (AFM picture of sputter deposited TiW. Settings used: 150 W, 0.001mbar, 5 min)
- 09:32, 1 September 2008 Jml talk contribs deleted page Characterization/SEM: Scanning Electron Microscopy/Jeol (content was: 'tyk' (and the only contributor was 'Jml'))
- 09:14, 1 September 2008 Jml talk contribs changed group membership for Jmltest from danchip to (none)
- 09:14, 1 September 2008 Jml talk contribs changed group membership for Jmltest from (none) to danchip (test)
- 08:12, 29 August 2008 BGE talk contribs changed group membership for Jml from danchip to danchip, administrator and bureaucrat
- 11:12, 13 August 2008 Kn talk contribs uploaded File:Cr 404W 001mbar.jpg (AFM picture of sputter deposited Cr layer. Settings used: 405 W, 0.001 mbar.)
- 10:14, 13 August 2008 Kn talk contribs uploaded File:Cr 405W 004mbar.jpg (AFM picture of Cr layer sputter deposited in Wordentec. Settings: 405W, 0.004mbar)
- 08:37, 13 August 2008 Kn talk contribs uploaded File:E beam Cr 10Angs s.jpeg (AFM picture of Cr layerdeposited with e-beam evaporation in Wordentec. Deposition rate 10 Å/s.)
- 16:34, 12 August 2008 Kn talk contribs uploaded File:E beam Cr 10Angs s.ppt
- 16:34, 12 August 2008 Kn talk contribs uploaded a new version of File:E beam Cr 10Å s.ppt (AFM picture of e-beam deposited Cr layer, deposited with Wordentec. Rate 1 nm/s.)
- 16:29, 12 August 2008 Kn talk contribs uploaded File:E beam Cr 10Å s.ppt (AFM picture of Cr layer deposited with E-beam evaporation in Wordentec. Deposition rate 10 Å/s.)
- 11:43, 12 August 2008 Kn talk contribs uploaded File:Cr 150W 001mbar.jpg (AFM picture of sputter deposited Cr layer. 150W and 0.001 mbar used.)
