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• 10:56, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography/Coating with Thermal Aluminium (content was: "For non-conductive samples, such as glass or quartz wafers, a charge dissipation layer is required on the top of the E-beam resist, for reduction of electrostatic charging of the surface of the substrate. You can keep the wafers with ZEP...")