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• 10:56, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography/TEBN1 (content was: "TEBN1 is a negative tone e-beam writer resist with very high resolution and very low sensitivities. the maximum resit thickness can be achieved by spin coating is 40nm. the typical dose needed for exposure is around 5000µc/cm<sup>2</sup...")